Invention Application
- Patent Title: THROUGH-SUBSTRATE VIA WITH A FUSE STRUCTURE
- Patent Title (中): 通过保险丝结构通过基板
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Application No.: US13801009Application Date: 2013-03-13
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Publication No.: US20140266286A1Publication Date: 2014-09-18
- Inventor: Vidhya Ramachandran , Shiqun Gu , Brian M. Henderson , Michael Scott DiBattista , Babak Motamedi , George F. Gaut
- Applicant: QUALCOMM INCORPORATED
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM INCORPORATED
- Current Assignee: QUALCOMM INCORPORATED
- Current Assignee Address: US CA San Diego
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L23/525 ; G01R31/26 ; G06F17/50

Abstract:
A device includes a conductive via to provide an electrical path through a substrate. The device further includes a conductive element. The device further includes a fuse coupled to the conductive via and coupled to the conductive element to provide a conductive path between the conductive via and the conductive element. The conductive path enables testing of continuity of at least a portion of the conductive via. The fuse is configured to be disabled after the testing of the continuity of the conductive via.
Information query
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