Invention Application
- Patent Title: SEMICONDUCTOR STRUCTURE AND METHOD FOR TESTING THE SAME
- Patent Title (中): 半导体结构及其测试方法
-
Application No.: US13890397Application Date: 2013-05-09
-
Publication No.: US20140332952A1Publication Date: 2014-11-13
- Inventor: Chien-Li Kuo , Yung-Chang Lin , Chun-Ting Yeh , Kuei-Sheng Wu
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/66

Abstract:
A semiconductor structure comprising a substrate, a dielectric layer, a conductor post, a first conductive layer structure and a second conductive layer structure is provided. The substrate comprises an opening structure. The dielectric layer is disposed on a sidewall of the opening structure. The conductor structure is disposed in the opening structure and covers the dielectric layer. The first and second conductive layer structures are electrically connected to the conductor post. A voltage difference is existed between the first and second conductive layer structures, such that a current is passing through the first conductive layer structure, the opening structure and second conductive layer structure. A resistance values is related to the voltage difference and the current. A dimension of the opening structure is 10 times greater than a dimension of the first and second conductive layer structures.
Information query
IPC分类: