Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC装置和装置制造方法
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Application No.: US14357530Application Date: 2012-12-05
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Publication No.: US20140340666A1Publication Date: 2014-11-20
- Inventor: Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2012/074507 WO 20121205
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Public/Granted literature
- US09494869B2 Lithographic apparatus and device manufacturing method Public/Granted day:2016-11-15
Information query
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