公开(公告)号：US20140340666A1

公开(公告)日：2014-11-20

申请号：US14357530

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Arno Jan Bleeker ,  Pieter Renaat Marie Hennus ,  Martinus Hendricus Henricus Hoeks ,  Sven Antoin Johan Hol ,  Harmen Klaas Van Der Schoot ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Marc Wilhelmus Maria Van Der Wijst ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Ruud Antonius Catharina Maria Beerens ,  Olof Martinus Josephus Fischer ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Niels Johannes Maria Bosch

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。