-
公开(公告)号：US20190171109A1
公开(公告)日：2019-06-06
申请号：US16257955
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
-
公开(公告)号：US09851644B2
公开(公告)日：2017-12-26
申请号：US15237394
申请日：2016-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70775 , G03F7/70783 , G03F7/7085 , G03F7/70858 , G03F7/70875
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
-
公开(公告)号：US20140340659A1
公开(公告)日：2014-11-20
申请号：US14375457
申请日：2013-01-25
Applicant: ASML Netherlands B.V.
Inventor： Jan Bernard Plechelmus Van Schoot , Adrianus Hendrik Koevoets , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Koen Jacobus Johannes Maria Zaal
IPC: G03F7/20
CPC classification number: G03F7/70891 , G03F7/70266 , G03F7/70775 , G03F7/70833 , G03F7/7085 , G03F7/70858
Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。
-
公开(公告)号：US10732511B2
公开(公告)日：2020-08-04
申请号：US16257955
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
-
公开(公告)号：US10216093B2
公开(公告)日：2019-02-26
申请号：US14762190
申请日：2013-12-12
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
-
Patent Agency Ranking
公开(公告)号：US09436096B2
公开(公告)日：2016-09-06
申请号：US14586333
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70775 , G03F7/70783 , G03F7/7085 , G03F7/70858 , G03F7/70875
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
-
7.发明申请Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein 有权平版印刷设备包括用于保持物体的支撑件及其中使用的支撑件公开(公告)号：US20150002832A1
公开(公告)日：2015-01-01
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
-
公开(公告)号：US09785060B2
公开(公告)日：2017-10-10
申请号：US14423405
申请日：2013-08-19
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
CPC classification number: G03F7/70725 , G01D5/34 , G01D5/38 , G03F7/70775 , G03F7/70933
Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
-
公开(公告)号：US09470969B2
公开(公告)日：2016-10-18
申请号：US13686186
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
IPC: G03B27/58 , H01L21/683 , G03F7/20
CPC classification number: G03B27/58 , G03F7/2051 , G03F7/707 , G03F7/70708 , H01L21/683
Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
Abstract translation: 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。
-
10.发明授权Lithographic apparatus comprising a support for holding an object, and a support for use therein 有权光刻设备包括用于保持物体的支撑件和用于其中的支撑件公开(公告)号：US09195150B2
公开(公告)日：2015-11-24
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
-
-
-
-
-
-
-
-
-
Search Results
20
records
(took 0.017 seconds)
