发明申请
- 专利标题： TONE INVERSION OF SELF-ASSEMBLED SELF-ALIGNED STRUCTURES
- 专利标题（中）： 自组装自对准结构的音调反演
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申请号： US13603869申请日： 2012-09-05
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公开(公告)号： US20140353800A1公开(公告)日： 2014-12-04
- 发明人: Michael A. GUILLORN , Steven J. HOLMES , Chi-Chun LIU , Hiroyuki MIYAZOE , Hsinyu TSAI
- 申请人： Michael A. GUILLORN , Steven J. HOLMES , Chi-Chun LIU , Hiroyuki MIYAZOE , Hsinyu TSAI
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： H01L21/033
- IPC分类号： H01L21/033 ; H01L21/308
摘要：
A stack of an organic planarization layer (OPL) and a template layer is provided over a substrate. The template layer is patterned to induce self-assembly of a copolymer layer to be subsequently deposited. A copolymer layer is deposited and annealed to form phase-separated copolymer blocks. An original self-assembly pattern is formed by removal of a second phase separated polymer relative to a first phase separated polymer. The original pattern is transferred into the OPL by an anisotropic etch, and the first phase separated polymer and the template layer are removed. A spin-on dielectric (SOD) material layer is deposited over the patterned OPL that includes the original pattern to form SOD portions that fill trenches within the patterned OPL. The patterned OPL is removed selective to the SOD portions, which include a complementary pattern. The complementary pattern of the SOD portions is transferred into underlying layers by an anisotropic etch.
公开/授权文献
- US08921030B2 Tone inversion of self-assembled self-aligned structures 公开/授权日：2014-12-30
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