Invention Application
- Patent Title: PHOTORESISTS COMPRISING CARBAMATE COMPONENT
- Patent Title (中): 包含碳酸盐组分的电影
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Application No.: US13907789Application Date: 2013-05-31
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Publication No.: US20140356785A1Publication Date: 2014-12-04
- Inventor: William Williams, III , Cong Liu , Cheng-Bai Xu
- Applicant: The Dow Chemical Company
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20
Abstract:
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Public/Granted literature
- US10539870B2 Photoresists comprising carbamate component Public/Granted day:2020-01-21
Information query
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