发明申请
US20140374887A1 COMPOSITION FOR FORMING PASSIVATION FILM, INCLUDING RESIN HAVING CARBON-CARBON MULTIPLE BOND
审中-公开
形成钝化膜的组合物，包括具有碳碳多孔粘结剂的树脂
- 专利标题： COMPOSITION FOR FORMING PASSIVATION FILM, INCLUDING RESIN HAVING CARBON-CARBON MULTIPLE BOND
- 专利标题（中）： 形成钝化膜的组合物，包括具有碳碳多孔粘结剂的树脂
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申请号： US14374668申请日： 2013-02-08
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公开(公告)号： US20140374887A1公开(公告)日： 2014-12-25
- 发明人: Mamoru Tamura , Hiroshi Ogino , Tomoyuki Enomoto
- 申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 申请人地址： JP Tokyo
- 专利权人： NISSAN CHEMICAL IMDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL IMDUSTRIES, LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2012-026075 20120209
- 国际申请： PCT/JP2013/053067 WO 20130208
- 主分类号： H01L21/56
- IPC分类号： H01L21/56 ; C09D161/16 ; H01L29/06 ; C09D181/06 ; H01L21/02 ; C08G8/02 ; C08G75/20
摘要：
There is provided a composition for forming a passivation film that satisfies electric insulation, heat-tolerance, solvent-tolerance, and a dry etch back property at the same time. A composition for forming a passivation film, including: a polymer containing a unit structure of Formula (i): T0-O Formula (i) (where T0 is a sulfonyl group, a fluoroalkylene group, a cycloalkylene group, or an arylene group having a substituent, or is a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cycloalkylene group), wherein the polymer has at least one of a group having a structure of Formula (2-A), a group having a structure of Formula (2-B), or a group having both of the structures, at an end, in a side chain, or in a main chain of the polymer: The polymer may contain a unit structure of Formula (1): L1-O-T1-O Formula (1)
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