发明申请
US20150128860A1 DEPOSITION SYSTEMS HAVING DEPOSITION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY WITH RADIATION DEFLECTION AND RELATED METHODS
审中-公开
具有配置有辐射偏差的现场计量的沉积室的沉积系统及相关方法
- 专利标题： DEPOSITION SYSTEMS HAVING DEPOSITION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY WITH RADIATION DEFLECTION AND RELATED METHODS
- 专利标题（中）： 具有配置有辐射偏差的现场计量的沉积室的沉积系统及相关方法
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申请号： US14401261申请日： 2013-05-24
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公开(公告)号： US20150128860A1公开(公告)日： 2015-05-14
- 发明人: Claudio Canizares , Ding Ding
- 申请人： Soitec
- 申请人地址： FR Crolles Cedex
- 专利权人： Soitec
- 当前专利权人： Soitec
- 当前专利权人地址： FR Crolles Cedex
- 国际申请： PCT/IB2013/001056 WO 20130524
- 主分类号： C23C16/48
- IPC分类号： C23C16/48 ; C30B25/08 ; C23C16/52
摘要：
Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.
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