Invention Application
- Patent Title: COMPOSITION AND METHOD FOR POLISHING MOLYBDENUM
- Patent Title (中): 用于抛光莫来石的组合物和方法
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Application No.: US14686988Application Date: 2015-04-15
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Publication No.: US20150221520A1Publication Date: 2015-08-06
- Inventor: Pankaj SINGH , Lamon JONES
- Applicant: Cabot Microelectronics Corporation
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C09G1/02

Abstract:
The present invention provides compositions and methods for polishing a molybdenum metal-containing surface. A polishing composition (slurry) described herein comprises an abrasive concentration of an inorganic particulate abrasive material (e.g., alumina or silica) suspended in an acidic aqueous medium containing a water soluble surface active material and an oxidizing agent. The surface active material is selected based on the zeta potential of the particulate abrasive, such that when the abrasive has a positive zeta potential, the surface active material comprises a cationic material, and when the particulate abrasive has a negative zeta potential, the surface active material comprises an anionic material, a non-ionic material, or a combination thereof.
Information query
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