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Invention Application
US20150274517A1 METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE 审中-公开
在MEMS器件的执行器层上改善表面粗糙度和消除尖锐角度的方法

  • Patent Title: METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE
  • Patent Title (中): 在MEMS器件的执行器层上改善表面粗糙度和消除尖锐角度的方法
  • Application No.: US14453431
    Application Date: 2014-08-06
  • Publication No.: US20150274517A1
    Publication Date: 2015-10-01
  • Inventor: Peter SMEYS , Jongwoo SHIN , Jong Il SHIN
  • Applicant: InvenSense, Inc.
  • Main IPC: B81C1/00
  • IPC: B81C1/00
METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE
Abstract:
A method for forming an actuator layer of a MEMS device is disclosed. The method comprising etching the actuator layer and annealing the actuator layer after etching to reduce surface roughness of the MEMS device.
Abstract(Chinese):

公开了一种用于形成MEMS装置的致动器层的方法。 该方法包括蚀刻致动器层并且在蚀刻之后使致动器层退火以减小MEMS器件的表面粗糙度。

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