A plasma processing system includes a bottom electrode disposed in a chamber. A lower extended electrode is disposed around the bottom electrode. An upper ceramic plate is disposed above the bottom electrode in an opposing relationship. An upper extended electrode is disposed around the upper ceramic plate. A lower process exclusion zone (PEZ) ring is situated between the lower extended electrode and the bottom electrode. An upper PEZ ring is situated between the upper extended electrode and the upper ceramic plate, with the upper PEZ ring having an RF electrode ring embedded therein. The system also includes a first RF generator for generating RF power for the bottom electrode, a second RF generator for generating RF power for the RF electrode ring embedded in the upper PEZ ring, and a controller for transmitting processing instructions. The processing instructions include power settings for the first and second RF generators.