Invention Application
- Patent Title: TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
- Patent Title (中): TOPCOAT组合物和光刻方法
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Application No.: US14577473Application Date: 2014-12-19
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Publication No.: US20150323869A1Publication Date: 2015-11-12
- Inventor: Cong Liu , Doris H. Kang , Deyan Wang , Cheng-Bai Xu , Mingqi Li , Chunyi Wu
- Applicant: The Dow Chemical Company
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C09D133/16 ; G03F7/32 ; G03F7/16 ; G03F7/20
Abstract:
Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I), wherein R1 and R2 are alkyl groups of 3-8 carbons and the total number of carbons of R1 and R2 is greater than 6; and 2) a second organic solvent that is a C4 to C10 monovalent alcohol.
Public/Granted literature
- US11846885B2 Topcoat compositions and photolithographic methods Public/Granted day:2023-12-19
Information query
IPC分类:
