Invention Application
- Patent Title: SEMICONDUCTOR DEVICE
- Patent Title (中): 半导体器件
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Application No.: US14705511Application Date: 2015-05-06
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Publication No.: US20150325693A1Publication Date: 2015-11-12
- Inventor: Takahiro MORI
- Applicant: RENESAS ELECTRONICS CORPORATION
- Priority: JP2014-097941 20140509
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/08 ; H01L29/417 ; H01L29/40

Abstract:
A field oxide film lies extending from the underpart of a gate electrode to a drain region. A plurality of projection parts projects from the side face of the gate electrode from a source region side toward a drain region side. The projection parts are arranged side by side along a second direction (direction orthogonal to a first direction along which the source region and the drain region are laid) in plan view. A plurality of openings is formed in the field oxide film. Each of the openings is located between projection parts adjacent to each other when seen from the first direction. The edge of the opening on the drain region side is located closer to the source region than the drain region. The edge of the opening on the source region side is located closer to the drain region than the side face of the gate electrode.
Public/Granted literature
- US09761714B2 Semiconductor device Public/Granted day:2017-09-12
Information query
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