Invention Application
US20160070167A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND
有权
图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法，电子器件和化合物
- Patent Title: PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND
- Patent Title (中): 图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法，电子器件和化合物
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Application No.: US14840654Application Date: 2015-08-31
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Publication No.: US20160070167A1Publication Date: 2016-03-10
- Inventor: Shohei KATAOKA , Akinori SHIBUYA , Toshiaki FUKUHARA , Hajime FURUTANI , Michihiro SHIRAKAWA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2013-041153 20130301
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/32 ; C07C311/51 ; G03F7/20
Abstract:
There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.
Public/Granted literature
Information query
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