公开(公告)号：US20170351176A1

公开(公告)日：2017-12-07

申请号：US15685499

申请日：2017-08-24

申请人： FUJIFILM Corporation

发明人： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Toshiaki FUKUHARA ,  Shuji HIRANO

IPC分类号： G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  G03F7/30 ,  G03F1/50

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US20150111135A1

公开(公告)日：2015-04-23

申请号：US14580686

申请日：2014-12-23

申请人： FUJIFILM Corporation

发明人： Shohei KATAOKA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA

IPC分类号： G03F7/038 ,  G03F7/30

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

摘要： The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem. 1] RN-A−X+  (I)

摘要翻译： 本发明的图案形成方法包括：（i）形成含有由下述通式（I）表示的化合物（A）的光化射线敏感性或辐射敏感性树脂组合物的膜; 能够通过酸的作用降低对包含有机溶剂的显影剂的溶解度的树脂（P）; 和能够通过光化射线或辐射的照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; （iii）使用包含有机溶剂的显影剂显影用光化射线或辐射照射的薄膜。 [Chem。 1] RN-A-X +（I）

公开(公告)号：US20150160559A1

公开(公告)日：2015-06-11

申请号：US14625782

申请日：2015-02-19

申请人： FUJIFILM Corporation

发明人： Akinori SHIBUYA ,  Shohei KATAOKA ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Akiyoshi GOTO

IPC分类号： G03F7/30 ,  G03F7/038

CPC分类号： G03F7/30 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

摘要： There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

摘要翻译： 提供了一种图案形成方法，其包括：通过使用辐射敏感或光化射线敏感性树脂组合物形成膜，其包含：（A）阳离子部分中含有氮原子的鎓盐化合物; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）能够通过酸的作用增加极性以降低在含有有机溶剂的显影剂中的溶解性的树脂，使该膜曝光; 并通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案。

公开(公告)号：US20140248562A1

公开(公告)日：2014-09-04

申请号：US14271606

申请日：2014-05-07

申请人： FUJIFILM CORPORATION

发明人： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA ,  Junichi ITO ,  Shohei KATAOKA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA

IPC分类号： G03F7/038

CPC分类号： G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

摘要翻译： 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B） 树脂。

公开(公告)号：US20140212814A1

公开(公告)日：2014-07-31

申请号：US14229190

申请日：2014-03-28

申请人： FUJIFILM Corporation

发明人： Junichi ITO ,  Akinori SHIBUYA ,  Tomoki MATSUDA ,  Yoko TOKUGAWA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Shohei KATAOKA

IPC分类号： G03F7/027

CPC分类号： G03F7/027 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  C07D279/30 ,  C07D307/33 ,  C07D327/08 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.

摘要翻译： 本发明提供了一种光化学射线或辐射敏感性树脂组合物，其包括以下通式（1）的任何化合物：当暴露于光化射线或辐射时，其被分解，从而产生酸和树脂，当被 酸分解，从而增加其在碱性显影剂中的溶解度。

公开(公告)号：US20220252985A1

公开(公告)日：2022-08-11

申请号：US17724956

申请日：2022-04-20

申请人： FUJIFILM Corporation

发明人： Toshiaki FUKUHARA ,  Takeshi KAWABATA ,  Sou KAMIMURA

IPC分类号： G03F7/075 ,  G03F7/11 ,  G03F7/32 ,  G03F7/20

摘要： A composition for forming an underlayer film is used for forming an underlayer film under a resist film, the composition including a silicon atom-containing compound and a halogen-based solvent, in which a content of the halogen-based solvent is 1.0 ppb by mass to 50.0 ppm by mass with respect to a total mass of the composition for forming an underlayer film.

公开(公告)号：US20190137875A1

公开(公告)日：2019-05-09

申请号：US16234022

申请日：2018-12-27

申请人： FUJIFILM Corporation

发明人： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Toshiaki FUKUHARA ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO

IPC分类号： G03F7/039 ,  H01L21/027

摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a resin which has a repeating unit having an alkyleneoxy chain and a repeating unit having an aromatic group, and has a concentration of the solid content of 10% by mass or more. A pattern forming method has (i) forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 μm or more on a substrate with an actinic ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit having an alkyleneoxy chain.

公开(公告)号：US20160070167A1

公开(公告)日：2016-03-10

申请号：US14840654

申请日：2015-08-31

申请人： FUJIFILM CORPORATION

发明人： Shohei KATAOKA ,  Akinori SHIBUYA ,  Toshiaki FUKUHARA ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA

IPC分类号： G03F7/038 ,  G03F7/32 ,  C07C311/51 ,  G03F7/20

CPC分类号： G03F7/038 ,  C07C25/18 ,  C07C233/04 ,  C07C235/88 ,  C07C311/03 ,  C07C311/06 ,  C07C311/51 ,  C07C311/53 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D411/06 ,  C08F220/26 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325 ,  H01L21/0275

摘要： There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

摘要翻译： 提供了一种图案形成方法，其包括（i）形成含有光化射线敏感性或辐射敏感性树脂组合物的膜的步骤，所述树脂组合物含有（A）由特定式表示的化合物，（B）不同于化合物 （A），并且能够在用光化射线或辐射照射时产生酸，和（P）不与化合物（A）产生的酸反应的树脂，并且能够降低对有机溶剂 - 通过由化合物（B）产生的酸的作用，（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂显影曝光的膜以形成负型图案的步骤 ; 上述的光化射线敏感或辐射敏感树脂组合物; 使用该组合物的抗蚀剂膜。

公开(公告)号：US20150118621A1

公开(公告)日：2015-04-30

申请号：US14588579

申请日：2015-01-02

申请人： FUJIFILM Corporation

发明人： Toshiaki FUKUHARA ,  Kaoru IWATO

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/20 ,  C08F220/18 ,  C08F220/28 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

摘要： Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing a repeating unit (P1) with a cyclic carbonic acid ester structure and any of repeating units (P2) of general formula (P2-1) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.

摘要翻译： 提供了形成图案的方法，包括（a）形成包含光化射线或辐射敏感性树脂组合物的膜，所述树脂组合物包含含有环状碳酸酯结构的重复单元（P1）的树脂（P）和任何 的下列通式（P2-1）的重复单元（P2）和当暴露于光化射线或辐射时产生酸的化合物（B），（b）将膜暴露于光化射线或辐射，和（c ）用包含有机溶剂的显影剂显影曝光的膜，从而获得负图案。

公开(公告)号：US20140234759A1

公开(公告)日：2014-08-21

申请号：US14229240

申请日：2014-03-28

申请人： FUJIFILM Corporation

发明人： Shohei KATAOKA ,  Akinori SHIBUYA ,  Junichi ITO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Yoko TOKUGAWA

IPC分类号： G03F7/038

CPC分类号： G03F7/038 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

摘要翻译： 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元 产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐 结构体。