公开(公告)号：US20140212814A1

公开(公告)日：2014-07-31

申请号：US14229190

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Akinori SHIBUYA ,  Tomoki MATSUDA ,  Yoko TOKUGAWA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Shohei KATAOKA

IPC: G03F7/027

CPC classification number: G03F7/027 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  C07D279/30 ,  C07D307/33 ,  C07D327/08 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.

Abstract translation: 本发明提供了一种光化学射线或辐射敏感性树脂组合物，其包括以下通式（1）的任何化合物：当暴露于光化射线或辐射时，其被分解，从而产生酸和树脂，当被 酸分解，从而增加其在碱性显影剂中的溶解度。

公开(公告)号：US20130122427A1

公开(公告)日：2013-05-16

申请号：US13725483

申请日：2012-12-21

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Kaoru IWATO ,  Kana FUJII ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Keita KATO ,  Shuhei YAMAGUCHI

IPC: G03F7/004

CPC classification number: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

Abstract translation: 图案形成方法包括：（i）由光化学射线敏感或辐射敏感的树脂组合物形成膜，所述树脂组合物含有（A）在用光化射线或辐射照射时能够产生酸的化合物，并通过 酸降低化合物（A）对有机溶剂的溶解度的作用; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。

公开(公告)号：US20190157720A1

公开(公告)日：2019-05-23

申请号：US16251089

申请日：2019-01-18

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Naoya HATAKEYAMA

IPC: H01M10/0568 ,  H01M10/0569 ,  H01M10/0567

Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.

公开(公告)号：US20150111135A1

公开(公告)日：2015-04-23

申请号：US14580686

申请日：2014-12-23

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem. 1] RN-A−X+  (I)

Abstract translation: 本发明的图案形成方法包括：（i）形成含有由下述通式（I）表示的化合物（A）的光化射线敏感性或辐射敏感性树脂组合物的膜; 能够通过酸的作用降低对包含有机溶剂的显影剂的溶解度的树脂（P）; 和能够通过光化射线或辐射的照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; （iii）使用包含有机溶剂的显影剂显影用光化射线或辐射照射的薄膜。 [Chem。 1] RN-A-X +（I）

公开(公告)号：US20140234762A1

公开(公告)日：2014-08-21

申请号：US14272996

申请日：2014-05-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method including: a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group, and a compound capable of generating acid through irradiation of actinic rays or radiation; a process of exposing the film; and a process of developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the value X obtained by substituting the number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following formula is 0

Abstract translation: 一种图案形成方法，包括：使用含有具有能够被酸分解并产生羧基的基团的重复单元（a1）的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法，以及 能够通过光化射线或辐射照射产生酸的化合物; 曝光电影的过程; 以及使用包含有机溶剂的显影剂显影曝光的薄膜以形成负色调图案的方法，其中通过用酸分解后将重复单元（a1）中包含的每个原子的数目取代而得到的值X，并产生 下式中的羧基为0

公开(公告)号：US20140127629A1

公开(公告)日：2014-05-08

申请号：US14153613

申请日：2014-01-13

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO ,  Shohei KATAOKA ,  Shoichi SAITOH

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40

Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成在膜中，（b）将膜曝光，和（c）用含有第一有机溶剂的显影剂显影曝光的膜，其中在 显影剂，每个具有0.3μm或更大直径的颗粒的密度为30个/ ml或更小。

公开(公告)号：US20170097565A1

公开(公告)日：2017-04-06

申请号：US15384521

申请日：2016-12-20

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Keiyu OU

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/40 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a basic compound (A) corresponding to at least one of the following basic compound (A1) or (A2): (A1) a nonionic compound having an alicyclic structure (a1) and a basic site (b2) at a site different from the alicyclic structure within one molecule, or (A2) a nonionic compound having a heterocyclic structure (a2) having no basicity and a basic site (b2) at a site different from the heterocyclic structure within one molecule.

公开(公告)号：US20160070167A1

公开(公告)日：2016-03-10

申请号：US14840654

申请日：2015-08-31

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Toshiaki FUKUHARA ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA

IPC: G03F7/038 ,  G03F7/32 ,  C07C311/51 ,  G03F7/20

CPC classification number: G03F7/038 ,  C07C25/18 ,  C07C233/04 ,  C07C235/88 ,  C07C311/03 ,  C07C311/06 ,  C07C311/51 ,  C07C311/53 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D411/06 ,  C08F220/26 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325 ,  H01L21/0275

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract translation: 提供了一种图案形成方法，其包括（i）形成含有光化射线敏感性或辐射敏感性树脂组合物的膜的步骤，所述树脂组合物含有（A）由特定式表示的化合物，（B）不同于化合物 （A），并且能够在用光化射线或辐射照射时产生酸，和（P）不与化合物（A）产生的酸反应的树脂，并且能够降低对有机溶剂 - 通过由化合物（B）产生的酸的作用，（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂显影曝光的膜以形成负型图案的步骤 ; 上述的光化射线敏感或辐射敏感树脂组合物; 使用该组合物的抗蚀剂膜。

公开(公告)号：US20140234759A1

公开(公告)日：2014-08-21

申请号：US14229240

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Junichi ITO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Yoko TOKUGAWA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元 产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐 结构体。

公开(公告)号：US20140045117A1

公开(公告)日：2014-02-13

申请号：US14035139

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/28 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  C08F2220/283 ,  C08F220/42 ,  C08F2220/1825

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）能够通过酸的作用分解的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 以产生由本说明书中定义的下式（I）表示的羧基，和（B）能够在用光化射线或辐射照射时产生酸的化合物; （ii）曝光胶片的步骤; 和（iii）通过使用含有有机溶剂的显影剂进行显影以形成负图案的步骤。