公开(公告)号：US20160327866A1

公开(公告)日：2016-11-10

申请号：US15216777

申请日：2016-07-22

Applicant: FUJIFILM Corporation

Inventor： Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA

IPC: G03F7/16

CPC classification number: G03F7/16 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/325 ,  G03F7/38

Abstract: A pattern forming method includes, in this order: a step (1) of forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin having a group that is decomposed due to an action of an acid so as to generate a polar group; a step (2) of exposing the film; a step (3) of causing the exposed film to come into contact with a component that performs any one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction with a polar group generated in the exposed film without substantially dissolving the exposed film; and a step (4) of forming a pattern by developing the exposed film by using a developer including an organic solvent and removing an area of the film having a small exposure amount.

Abstract translation: 图案形成方法依次包括：通过使用至少含有具有由于作用分解的基团的树脂的光化射线敏感或辐射敏感性树脂组合物在基材上形成膜的步骤（1） 的酸，以产生极性基团; 曝光胶片的步骤（2）; 使暴露的膜与在暴露的膜中产生的极性基团进行离子键，氢键，化学键和偶极相互作用的任何一个相互作用的组分接触的步骤（3） 溶解曝光胶片; 以及通过使用包含有机溶剂的显影剂使曝光的膜显影并除去具有小曝光量的膜的区域来形成图案的步骤（4）。

公开(公告)号：US20200050106A1

公开(公告)日：2020-02-13

申请号：US16655447

申请日：2019-10-17

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Mitsuhiro FUJITA ,  Tomotaka TSUCHIMURA ,  Takashi KAWASHIMA ,  Michihiro OGAWA ,  Akihiro KANEKO ,  Hironori OKA ,  Yasuharu SHIRAISHI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.

公开(公告)号：US20160195814A1

公开(公告)日：2016-07-07

申请号：US15069300

申请日：2016-03-14

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Ryosuke UEBA ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akiyoshi GOTO ,  Masafumi KOJIMA

IPC: G03F7/40 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/405 ,  G03F7/20 ,  G03F7/322 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0273

Abstract: There is provided a pattern formation method comprising: a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin of which, due to a polarity being increased by an action of an acid, solubility decreases with respect to a developer which includes an organic solvent; a step (2) of exposing the film to an actinic ray or radiation; a step (3) of forming a target process pattern by developing the film using a developer which includes an organic solvent; and a step (4) of obtaining a processed pattern by applying a processing agent which includes a compound (x) which has at least one of a primary amino group and a secondary amino group with respect to the target process pattern.

Abstract translation: 提供了一种图案形成方法，包括：使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤（1），其包含由于通过酸的作用而极性增加的树脂， 相对于包含有机溶剂的显影剂，溶解度降低; 将膜暴露于光化射线或辐射的步骤（2）; 通过使用包含有机溶剂的显影剂显影该膜来形成目标工艺图案的步骤（3）; 以及通过应用包括相对于目标工艺图案具有伯氨基和仲氨基中的至少一个的化合物（x）的处理剂来获得加工图案的步骤（4）。

公开(公告)号：US20170059995A1

公开(公告)日：2017-03-02

申请号：US15350913

申请日：2016-11-14

Applicant: FUJIFILM Corporation

Inventor： Hajime FURUTANI ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Masahiro YOSHIDOME ,  Masafumi KOJIMA

IPC: G03F7/32 ,  G03F7/16 ,  G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/038

CPC classification number: G03F7/322 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2006 ,  G03F7/325

Abstract: A pattern forming method includes a pattern forming method using an actinic ray-sensitive or radiation-sensitive resin composition in which ΔDth represented by the following Formula (1) satisfies 0.8 or more (in the formula, Dth(PTI) represents the threshold deprotection rate of the acid-decomposable group with respect to the film thickness of the actinic ray-sensitive or radiation-sensitive film after development using the alkali developer, and Dth(NTI) represents the threshold deprotection rate of the acid-decomposable group with respect to the film thickness of the actinic ray-sensitive or radiation-sensitive film after development using the developer including an organic solvent). ΔDth=Dth(PTI)/Dth(NTI)  (1)

Abstract translation: 使用被配置为使得由式（1）表示的ΔDth为0.8以上的活性光敏性或辐射敏感性树脂组合物的图案形成方法。 ΔDth= Dth（PTI）/ Dth（NTI）（1）（在公式中，Dth（PTI）表示酸分解基团与显影后的有源光敏感或辐射敏感膜的膜厚度的阈值去保护率 碱性显影剂液体; Dth（NTI）表示使用含有有机溶剂的显影剂液体显影后的酸分解基团与活性的光敏感或感光性膜的膜厚度的阈值去保护比。）

公开(公告)号：US20150331314A1

公开(公告)日：2015-11-19

申请号：US14811926

申请日：2015-07-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Mitsuhiro FUJITA

IPC: G03F7/004 ,  C07D409/02 ,  G03F7/32 ,  C07C311/48 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）具有能够通过酸的作用分解以产生极性基团的基团的树脂，（C1）含有能够产生的基团的化合物 通过光化射线或辐射照射后的第一酸性官能团和能够产生与光化射线或辐射照射时不同于第一酸性官能团的第二酸性官能团的基团，和（C2）至少一种含有两个 或更多选自由能够产生由光化射线或辐射照射的特定化学式表示的结构的基团组成的组。

公开(公告)号：US20210011377A1

公开(公告)日：2021-01-14

申请号：US17035746

申请日：2020-09-29

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Hironori OKA

IPC: G03F7/004 ,  G03F7/20 ,  C08L101/04 ,  G03F7/32

Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Requirements 1 to 3, Requirement 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[0]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[0]×16+[F]×19+[S]×32+[I]×127)  Formula (1): Requirement 2: The concentration of solid contents in the photosensitive composition for EUV light is 5.0% by mass or less, Requirement 3: The content of the photoacid generator is 5% to 50% by mass with respect to the total solid content in the photosensitive composition for EUV light.

公开(公告)号：US20190219921A1

公开(公告)日：2019-07-18

申请号：US16368522

申请日：2019-03-28

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Hajime FURUTANI ,  Akihiro KANEKO ,  Wataru NIHASHI ,  Shuji HIRANO

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/18 ,  H01L21/027

CPC classification number: G03F7/039 ,  C08F220/18 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  H01L21/0274

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R11 and R12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)

公开(公告)号：US20160070167A1

公开(公告)日：2016-03-10

申请号：US14840654

申请日：2015-08-31

Applicant: FUJIFILM CORPORATION

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Toshiaki FUKUHARA ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA

IPC: G03F7/038 ,  G03F7/32 ,  C07C311/51 ,  G03F7/20

CPC classification number: G03F7/038 ,  C07C25/18 ,  C07C233/04 ,  C07C235/88 ,  C07C311/03 ,  C07C311/06 ,  C07C311/51 ,  C07C311/53 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/06 ,  C07D333/46 ,  C07D333/76 ,  C07D411/06 ,  C08F220/26 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325 ,  H01L21/0275

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

Abstract translation: 提供了一种图案形成方法，其包括（i）形成含有光化射线敏感性或辐射敏感性树脂组合物的膜的步骤，所述树脂组合物含有（A）由特定式表示的化合物，（B）不同于化合物 （A），并且能够在用光化射线或辐射照射时产生酸，和（P）不与化合物（A）产生的酸反应的树脂，并且能够降低对有机溶剂 - 通过由化合物（B）产生的酸的作用，（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂显影曝光的膜以形成负型图案的步骤 ; 上述的光化射线敏感或辐射敏感树脂组合物; 使用该组合物的抗蚀剂膜。

公开(公告)号：US20160048082A1

公开(公告)日：2016-02-18

申请号：US14919329

申请日：2015-10-21

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akinori SHIBUYA

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/2053

Abstract: A pattern-forming method includes forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin that exhibits, due to an action of an acid, increase in polarity and decrease in solubility with respect to a developer including an organic solvent, and a compound that generates an acid by being irradiated with actinic rays or radiation; exposing the film; and forming a negative tone pattern by developing the exposed film with a developer including an organic solvent, in which the developer includes at least one compound A selected from the group consisting of an onium salt, a polymer having an onium salt, a nitrogen-containing compound including three or more nitrogen atoms, a basic polymer, and a phosphorus-based compound.

Abstract translation: 图案形成方法包括通过使用至少含有树脂的光化射线敏感性或辐射敏感性树脂组合物在基材上形成膜，所述树脂组合物由于酸的作用而显示极性增加并且溶解度降低 包括有机溶剂的显影剂和通过用光化射线或辐射照射产生酸的化合物; 曝光电影; 以及通过用包括有机溶剂的显影剂显影所述曝光膜形成负色调图案，其中所述显影剂包括至少一种选自以下的化合物A：鎓盐，具有鎓盐的聚合物，含氮的 包括三个或更多个氮原子的化合物，碱性聚合物和磷基化合物。