Invention Application
US20160087026A1 Resistor Formed Using Resistance Patterns and Semiconductor Devices Including the Same 有权
使用电阻图案形成的电阻和包括其的半导体器件

Resistor Formed Using Resistance Patterns and Semiconductor Devices Including the Same
Abstract:
Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertically protrude from the active regions and are connected to each other in the first direction, and contact electrodes on the resistance layer.
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