Invention Application
- Patent Title: Resistor Formed Using Resistance Patterns and Semiconductor Devices Including the Same
- Patent Title (中): 使用电阻图案形成的电阻和包括其的半导体器件
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Application No.: US14718685Application Date: 2015-05-21
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Publication No.: US20160087026A1Publication Date: 2016-03-24
- Inventor: Myung Gil Kang , Dongwon Kim , Ilryong Kim , Changwoo Oh , Keun Hwi Cho , Toshinori Fukai
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2014-0126733 20140923
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L27/06

Abstract:
Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertically protrude from the active regions and are connected to each other in the first direction, and contact electrodes on the resistance layer.
Public/Granted literature
- US09520458B2 Resistor formed using resistance patterns and semiconductor devices including the same Public/Granted day:2016-12-13
Information query
IPC分类: