Invention Application
US20160093763A1 DAMAGE FREE LASER PATTERNING OF TRANSPARENT LAYERS FOR FORMING DOPED REGIONS ON A SOLAR CELL SUBSTRATE
有权
用于在太阳能电池基板上形成掺杂区域的透明层的无损伤激光图案
- Patent Title: DAMAGE FREE LASER PATTERNING OF TRANSPARENT LAYERS FOR FORMING DOPED REGIONS ON A SOLAR CELL SUBSTRATE
- Patent Title (中): 用于在太阳能电池基板上形成掺杂区域的透明层的无损伤激光图案
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Application No.: US14787858Application Date: 2014-04-29
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Publication No.: US20160093763A1Publication Date: 2016-03-31
- Inventor: Virendra V. Rana , Pawan Kapur , Sean M. Seutter , Mehrdad M. Moslehi
- Applicant: SOLEXEL, INC.
- International Application: PCT/US2014/035965 WO 20140429
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0352
Abstract:
The laser patterning methods utilizing a laser absorbent hard mask in combination with wet etching to form patterned solar cell doped regions which may further improve cell efficiency by completely avoiding laser ablation of an underlying semiconductor substrate associated with ablation of an overlying transparent passivation layer.
Public/Granted literature
- US09768343B2 Damage free laser patterning of transparent layers for forming doped regions on a solar cell substrate Public/Granted day:2017-09-19
Information query
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