发明申请
- 专利标题： PHOTOMASK AND METHOD OF FORMING THE SAME AND METHODS OF MANUFACTURING ELECTRONIC DEVICE AND DISPLAY DEVICE USING THE PHOTOMASK
- 专利标题（中）： 照相机及其制造方法和使用光电子器件制造电子器件和显示器件的方法
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申请号： US14849006申请日： 2015-09-09
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公开(公告)号： US20160109794A1公开(公告)日： 2016-04-21
- 发明人: IL-yong JANG , Hyung-ho KO , Jin-sang YOON
- 申请人： IL-yong JANG , Hyung-ho KO , Jin-sang YOON
- 优先权： KR10-2014-0169976 20141201
- 主分类号： G03F1/26
- IPC分类号： G03F1/26 ; G03F7/22
摘要：
A phase shift mask includes a substrate, a second phase shift pattern on the substrate, the second phase shift pattern extending to an outermost perimeter of the substrate, the second phase shift pattern being formed of a material that is semi-transmissive to light of a first wavelength and the substrate being substantially transparent to the light of the first wavelength such that the mask transmits about 2 to about 10% of the light of the first wavelength at the second phase shift pattern, and a first phase shift pattern on the substrate, the second phase shift pattern being disposed between the outermost perimeter of the substrate and the first phase shift pattern.