Invention Application
US20160111258A1 GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL
审中-公开
气体输送装置,包括用于气体流量控制的气体分离器
- Patent Title: GAS SUPPLY DELIVERY ARRANGEMENT INCLUDING A GAS SPLITTER FOR TUNABLE GAS FLOW CONTROL
- Patent Title (中): 气体输送装置,包括用于气体流量控制的气体分离器
-
Application No.: US14886458Application Date: 2015-10-19
-
Publication No.: US20160111258A1Publication Date: 2016-04-21
- Inventor: Mark Taskar , Iqbal Shareef , Anthony Zemlock , Ryan Bise , Nathan Kugland
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67 ; C23C14/22 ; C23C16/50 ; C23C16/455

Abstract:
A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets.
Public/Granted literature
- US10431431B2 Gas supply delivery arrangement including a gas splitter for tunable gas flow control Public/Granted day:2019-10-01
Information query