Invention Application
- Patent Title: SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM STORING SUBSTRATE LIQUID PROCESSING PROGRAM
- Patent Title (中): 基板液体处理装置，基板液体处理方法和计算机可读存储介质储存基板液体处理程序
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Application No.: US14880462Application Date: 2015-10-12
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Publication No.: US20160111303A1Publication Date: 2016-04-21
- Inventor: Mitsunori Nakamori , Junichi Kitano , Teruomi Minami
- Applicant: Tokyo Electron Limited
- Priority: JP2014-213012 20141017; JP2015-167418 20150827
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; B08B3/08
Abstract:
Disclosed is a substrate liquid processing apparatus. The apparatus includes: a pure water supply unit (a rinse liquid supply unit) configured to supply pure water to a substrate; and a drying liquid supply unit configured to supply a drying liquid having a higher volatility than the pure water to the substrate. The substrate liquid processing apparatus is used to supply the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound, to the substrate, from the drying liquid supply unit.
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