Invention Application
- Patent Title: NANOPARTICLE FORMATION MITIGATION IN A DEPOSITION PROCESS
- Patent Title (中): 沉积过程中的纳米颗粒形成减缓
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Application No.: US14920081Application Date: 2015-10-22
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Publication No.: US20160115584A1Publication Date: 2016-04-28
- Inventor: James W. Neal , Brian T. Hazel , David A. Litton , Eric Jorzik
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Main IPC: C23C14/30
- IPC: C23C14/30 ; C23C14/54
Abstract:
A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.
Public/Granted literature
- US10704135B2 Nanoparticle formation mitigation in a deposition process Public/Granted day:2020-07-07
Information query
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