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    TOOLING FOR VAPOR DEPOSITION
    2.
    发明申请
    TOOLING FOR VAPOR DEPOSITION 审中-公开

    公开(公告)号：US20170144181A1

    公开(公告)日：2017-05-25

    申请号：US15006900

    申请日：2016-01-26

    Applicant: United Technologies Corporation

    Inventor： James W. Neal ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik ,  Michael J. Maloney

    IPC: B05B15/06

    CPC classification number: B05B15/62 ,  C23C14/24 ,  C23C14/243 ,  C23C14/505

    Abstract: An embodiment of an apparatus includes a first crucible in communication with a deposition chamber, an energy source, and a workpiece fixture. The first crucible includes a plurality of walls defining an upper recess and a first lower recess, at least the upper recess open to an interior of the deposition chamber. The energy source is configured to selectively apply and direct energy within the deposition chamber, including toward the first crucible. The workpiece fixture includes tooling and a plurality of workpiece holders configured to retain at least one workpiece selectively within the deposition chamber. The tooling includes at least one wall separating at least a first of the plurality of workpiece holders from a second of the plurality of workpiece holders.

    Coating Methods and Apparatus
    3.
    发明申请
    Coating Methods and Apparatus 审中-公开
    涂层方法和装置

    公开(公告)号：US20150152544A1

    公开(公告)日：2015-06-04

    申请号：US14617871

    申请日：2015-02-09

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： James W. Neal ,  Kevin W. Schlichting ,  Peter F. Gero

    IPC: C23C16/00

    CPC classification number: C23C16/00 ,  C23C14/30 ,  C23C14/50 ,  C23C14/541 ,  C23C14/564

    Abstract: An apparatus deposits a coating on a part. The apparatus comprises a chamber and a sting assembly for carrying the part. The sting assembly is shiftable between: an inserted condition where the sting assembly holds the part within the chamber for coating; and a retracted condition where the sting assembly holds the part outside of the chamber. The apparatus comprises a source of the coating material positioned to communicate the coating material to the part in the inserted condition. The apparatus comprises a thermal hood comprising a first member and a second member. The second member is between the first member and the part when the part is in the inserted condition. The second member is carried by the sting assembly so as to retract with the sting assembly as the sting assembly is retracted from the inserted condition to the retracted condition.

    Abstract translation: 一种装置在一个部件上沉积一层涂层。 该装置包括用于承载该部件的腔室和刺痛组件。 所述刺刺组件可以在以下插入状态之间移动：插入状态，其中所述刺刺组件将所述部分保持在所述腔室内用于涂覆; 以及收缩状态，其中所述刺刺组件将所述部分保持在所述腔室的外部。 该装置包括涂覆材料的源，其定位成将涂层材料连接到处于插入状态的部件。 该装置包括包含第一构件和第二构件的热罩。 当部件处于插入状态时，第二构件位于第一构件和部件之间。 第二构件由踩踏组件承载，以便当踩踏组件从插入状态缩回到缩回状态时，该踩踏组件随着踩踏组件而缩回。

    Deposition apparatus and methods
    4.
    发明授权
    Deposition apparatus and methods 有权

    公开(公告)号：US11365473B2

    公开(公告)日：2022-06-21

    申请号：US16527250

    申请日：2019-07-31

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/24 ,  C23C14/22 ,  C23C14/50

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    Deposition Apparatus and Methods
    6.
    发明申请
    Deposition Apparatus and Methods 审中-公开

    公开(公告)号：US20190352768A1

    公开(公告)日：2019-11-21

    申请号：US16527250

    申请日：2019-07-31

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/24 ,  C23C14/22 ,  C23C14/50

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

    FIXTURE FOR VAPOR DEPOSITION SYSTEM
    10.
    发明申请
    FIXTURE FOR VAPOR DEPOSITION SYSTEM 审中-公开

    公开(公告)号：US20200227234A1

    公开(公告)日：2020-07-16

    申请号：US16836337

    申请日：2020-03-31

    Applicant: United Technologies Corporation

    Inventor： James W. Neal ,  Michael J. Maloney ,  Kevin W. Schlichting ,  David A. Litton

    IPC: H01J37/30 ,  G01K1/14 ,  G01K7/02 ,  G01K13/08 ,  C23C14/50 ,  C23C14/24 ,  C23C14/54 ,  G01N25/00 ,  H01J37/317

    Abstract: A vapor deposition system fixture comprises an arm, a rake, a crown gear bearing assembly, a workpiece holder, a thermocouple, and a contact ring assembly. The crown gear bearing assembly is attached to and rotatably engaged with the rake and includes stationary portion and rotating portions. The workpiece holder is configured to rotate with the rotating portion. The thermocouple is configured to rotate with the workpiece holder. The contact ring assembly comprises a housing, a cover, first and second rotating contact rings, and first and second stationary contact rings. The housing is attached to at least one of the arm and the rake. The first and second rotating contact rings are electrically connected to the thermocouple. The first and second stationary contact rings surround the rotating ring. The first and second stationary contact rings are configured to receive an electrical signal from the first and second rotating contact rings.

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