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公开(公告)号:US11053855B2
公开(公告)日:2021-07-06
申请号:US16433896
申请日:2019-06-06
Applicant: United Technologies Corporation
Inventor: Brian T. Hazel , Alan C. Barron , Mary Catherine Gurak
IPC: C23C14/08 , C23C14/30 , C23C16/06 , C23C16/455 , F02C7/24
Abstract: A process for coating a component includes applying a bond coat on a substrate of a component; applying a thermal barrier material to the bond coat; and applying a conforming reflective layer to the thermal barrier material, the conforming reflective layer conforming to porous microstructure of the ceramic coating.
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公开(公告)号:US10889895B2
公开(公告)日:2021-01-12
申请号:US14736834
申请日:2015-06-11
Applicant: United Technologies Corporation
Inventor: James W. Neal , David A. Litton , Brian T. Hazel , Michael J. Maloney , Eric M. Jorzik
IPC: C23C14/50 , C23C14/56 , C23C14/30 , C23C14/02 , C23C14/58 , C23C16/46 , C23C14/22 , C23C16/455 , C23C16/458
Abstract: A deposition apparatus comprises: an infeed chamber; a preheat chamber; a deposition chamber; and optionally at least one of a cooldown chamber and an outlet chamber. At least a first of the preheat chamber and the cooldown chamber contains a buffer system for buffering workpieces respectively passing to or from the deposition chamber.
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公开(公告)号:US20200340100A1
公开(公告)日:2020-10-29
申请号:US16392003
申请日:2019-04-23
Applicant: United Technologies Corporation
Inventor: Kaylan M. Wessels , Brian T. Hazel , Michael J. Maloney , David A. Litton , Elisa M. Zaleski
Abstract: In accordance with the present disclosure, there is provided a process for limiting a critical stabilizer content in coatings comprising placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber, the source coating material having compositional range of LnO1.5 comprising a single cation mol % of 30-50% relative to zirconia (ZrO2), where Ln=La, Pr, Nd, Sm, Eu, Gd, and Tb and combinations thereof; energizing the source coating material with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from the source coating material; and depositing the source coating material as a coating system onto a surface of a work piece.
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公开(公告)号:US10775045B2
公开(公告)日:2020-09-15
申请号:US15115741
申请日:2015-01-09
Applicant: United Technologies Corporation
Inventor: Melvin Freling , Jessica L. Serra , Paul H. Zajchowski , Craig L. Ostrout , Brian T. Hazel , Mario P. Bochiechio
Abstract: An article such as a heat shield panel includes a substrate and a multi-layered coating supported on the substrate. The multi-layered coating can include alternating layers of different ceramic material compositions having individual thicknesses of less than 25 micrometers.
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公开(公告)号:US20200157673A1
公开(公告)日:2020-05-21
申请号:US16773098
申请日:2020-01-27
Applicant: United Technologies Corporation
Inventor: Brian T. Hazel , Jessica L. Serra , Xuan Liu
Abstract: A plasma spray gun has: a plasma outlet having an axis; and a plurality of liquid feedstock outlets having a non-uniform distribution about said axis.
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公开(公告)号:US10385444B2
公开(公告)日:2019-08-20
申请号:US14774489
申请日:2014-03-14
Applicant: United Technologies Corporation
Inventor: Brian T. Hazel , Michael J. Maloney , James W. Neal , David A. Litton
Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.
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公开(公告)号:US20190024510A1
公开(公告)日:2019-01-24
申请号:US15656960
申请日:2017-07-21
Applicant: United Technologies Corporation
Inventor: Brian T. Hazel , Kevin W. Schlichting , Michael J. Maloney
CPC classification number: F01D5/02 , C23C4/11 , C23C4/129 , C23C4/134 , C23C28/042 , F01D25/005 , F05D2300/21 , F05D2300/611
Abstract: Disclosed herein is a method comprising mixing a carrier liquid with particles and/or with a particle precursor to form a suspension or solution respectively; where the particles comprise a metal oxide; and where the particle precursor comprises a metal salt; injecting the suspension or solution through a plasma flame; and depositing the particles and/or the particle precursor onto a substrate to form an first abradable coating; where the first abradable coating comprises a plurality of cracks or voids that are substantially perpendicular to the substrate surface, where the substrate is a hub surface of a gas turbine engine or where the substrate is a cantilever stator.
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公开(公告)号:US20170176007A1
公开(公告)日:2017-06-22
申请号:US15115741
申请日:2015-01-09
Applicant: United Technologies Corporation
Inventor: Melvin Freling , Jessica L. Serra , Paul H. Zajchowski , Craig L. Ostrout , Brian T. Hazel , Mario P. Bochiechio
Abstract: An article such as a heat shield panel includes a substrate and a multi-layered coating supported on the substrate. The multi-layered coating can include alternating layers of different ceramic material compositions having individual thicknesses of less than 25 micrometers.
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公开(公告)号:US20170101709A1
公开(公告)日:2017-04-13
申请号:US14880861
申请日:2015-10-12
Applicant: United Technologies Corporation
Inventor: James W. Neal , Michael J. Maloney , Kevin W. Schlichting , Eric Jorzik , David A. Litton , Brian T. Hazel
CPC classification number: C23C14/30 , C23C14/0021 , C23C14/083 , F01D5/288 , F01D25/005 , F01D25/28 , F05D2230/31 , F05D2300/611
Abstract: A method includes forming a multi-layered ceramic barrier coating under a chamber pressure of greater than 1 Pascals. In the method, low- and high-dopant ceramic materials are evaporated using input evaporating energies that fall, respectively, above and below a threshold for depositing the materials in a columnar microstructure (low-dopant) and in a branched columnar microstructure (high-dopant).
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公开(公告)号:US20170016104A1
公开(公告)日:2017-01-19
申请号:US14730466
申请日:2015-06-04
Applicant: UNITED TECHNOLOGIES CORPORATION
Inventor: Brian T. Hazel , Mario P. Bochiechio
IPC: C23C4/04 , C04B35/622 , C04B35/626 , F01D11/08 , C04B37/00 , F01D5/28 , F01D9/04 , C23C4/134 , C04B35/486
Abstract: A ceramic coating process comprises introducing a suspension including a fine ceramic particulate suspended in a liquid carrier into a plasma torch. The method includes melting the fine ceramic particulate in the plasma torch; propelling the fine ceramic particulate toward a substrate; and forming a coating on the substrate, the coating comprises splats of the fine ceramic particulate.
Abstract translation: 陶瓷涂覆方法包括将悬浮在液体载体中的细陶瓷颗粒的悬浮液引入等离子体焰炬中。 该方法包括熔化等离子体焰炬中的细陶瓷颗粒; 将细陶瓷颗粒推向基板; 以及在所述基底上形成涂层,所述涂层包括所述细陶瓷颗粒的碎屑。
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