Invention Application
- Patent Title: LIQUID TREATMENT APPARATUS AND METHOD AND NON-TRANSITORY STORAGE MEDIUM
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Application No.: US15040362Application Date: 2016-02-10
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Publication No.: US20160161867A1Publication Date: 2016-06-09
- Inventor: Yuichi YOSHIDA , Kousuke YOSHIHARA
- Applicant: Tokyo Electron Limited
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Priority: JP2012-098079 20120423
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.
Public/Granted literature
- US09817323B2 Liquid treatment apparatus and method and non-transitory storage medium Public/Granted day:2017-11-14
Information query
IPC分类:
