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    LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM FOR LIQUID PROCESS
    1.
    发明申请
    LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM FOR LIQUID PROCESS 审中-公开
    液体加工设备，液体加工方法和液体过程储存介质

    公开(公告)号：US20140174475A1

    公开(公告)日：2014-06-26

    申请号：US14101669

    申请日：2013-12-10

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Koji TAKAYANAGI ,  Yukie MINEKAWA ,  Yuichi YOSHIDA ,  Kousuke YOSHIHARA ,  Yuichi TERASHITA ,  Toshinobu FURUSHO ,  Takashi SASA

    IPC: H01L21/67

    Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

    Abstract translation: 通过一个过滤器可以获得与提供多个过滤器时获得的过滤效率相似的过滤效率，并且可以防止生产量的降低。 基于来自控制单元101的控制信号，抗蚀剂液体L通过过滤器被吸入泵70。 吸入泵中的抗蚀剂液体的一部分从排出喷嘴7排出。剩余的抗蚀剂液体返回到过滤器的一次侧的供给管51b。 通过将等于排出量的补充量加到返回量来合成过程。 进行合成处理液的排出以及过滤器的过滤，进行与排出量与返回量之间的比例对应的次数。

    DEVELOPING METHOD
    2.
    发明申请
    DEVELOPING METHOD 有权
    发展方法

    公开(公告)号：US20130194557A1

    公开(公告)日：2013-08-01

    申请号：US13760399

    申请日：2013-02-06

    Applicant: Tokyo Electron Limited

    Inventor： Taro YAMAMOTO ,  Kousuke YOSHIHARA ,  Yuichi YOSHIDA

    IPC: H01L21/027

    CPC classification number: H01L21/027 ,  G03F7/3021 ,  H01L21/67051 ,  H01L21/6715

    Abstract: A method of developing a substrate including rotating the substrate and supplying a developing liquid from a discharge port of a developer nozzle onto the surface of the substrate, while moving the developer nozzle, disposed above the substrate, from a central portion towards a peripheral portion of the substrate, and supplying a first rinse liquid from a discharge port of a first rinse nozzle onto the surface of the substrate, while moving the first rinse nozzle, disposed above the substrate, from the central portion towards the peripheral portion of the substrate. The supplying of the developing liquid and the first rinse liquid are performed concurrently, with the first rinse nozzle being maintained nearer to a center of the substrate than the developer nozzle.

    Abstract translation: 一种显影衬底的方法，包括使衬底旋转并将显影液从显影剂喷嘴的排出口供应到衬底的表面上，同时将位于衬底上方的显影剂喷嘴从中心部分朝向衬底的周边部分移动 并且将第一冲洗液从第一冲洗喷嘴的排出口提供到基板的表面上，同时将设置在基板上方的第一冲洗喷嘴从中心部分朝向基板的周边部分移动。 同时进行显影液和第一漂洗液的供给，第一冲洗喷嘴比显影剂喷嘴更靠近基板的中心。

    FILTER UNIT PRETREATMENT METHOD, TREATMENT LIQUID SUPPLY APPARATUS, FILTER UNIT HEATING APPARATUS, AND TREATMENT LIQUID SUPPLY PASSAGE PRETREATMENT METHOD
    4.
    发明申请
    FILTER UNIT PRETREATMENT METHOD, TREATMENT LIQUID SUPPLY APPARATUS, FILTER UNIT HEATING APPARATUS, AND TREATMENT LIQUID SUPPLY PASSAGE PRETREATMENT METHOD 审中-公开
    过滤装置预处理方法，处理液体供应装置，过滤装置加热装置以及处理液体供给预处理方法

    公开(公告)号：US20160236124A1

    公开(公告)日：2016-08-18

    申请号：US15025045

    申请日：2014-09-26

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Yuichi YOSHIDA ,  Ryouichirou NAITOU ,  Arnaud Alain Jean DAUENDORFFER ,  Koji TAKAYANAGI ,  Shinobu MIYAZAKI

    IPC: B01D37/02 ,  B01D35/18

    CPC classification number: B01D37/02 ,  B01D35/18 ,  H01L21/67017

    Abstract: In one embodiment, after a new filter unit (3) is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part (31) of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

    Abstract translation: 在一个实施例中，在将新的过滤器单元（3）安装在处理液供给装置中之后，在使含溶剂的处理液通过过滤器单元之前，进行将过滤器单元与溶剂浸泡的步骤 预处理，然后从其中排出溶剂。 构成过滤器单元的过滤器部件（31）的材料对溶剂的溶解度大于材料对处理液体的溶解度。 该步骤使得可以在处理液体通过过滤器单元之前去除可能从过滤部分洗脱到处理液中以产生异物（颗粒）的组分。

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