Invention Application
- Patent Title: Charged Particle Source
- Patent Title (中): 带电粒子源
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Application No.: US14964221Application Date: 2015-12-09
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Publication No.: US20160163500A1Publication Date: 2016-06-09
- Inventor: Shuai Li
- Applicant: Hermes Microvision Inc.
- Main IPC: H01J37/143
- IPC: H01J37/143 ; H01J3/02 ; H01J37/28 ; H01J3/24

Abstract:
This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
Public/Granted literature
- US09799484B2 Charged particle source Public/Granted day:2017-10-24
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