Invention Application
US20160189940A1 RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS
审中-公开
具有用于制造太阳能电池的旋转靶的无线电频率飞溅系统
- Patent Title: RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS
- Patent Title (中): 具有用于制造太阳能电池的旋转靶的无线电频率飞溅系统
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Application No.: US15061936Application Date: 2016-03-04
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Publication No.: US20160189940A1Publication Date: 2016-06-30
- Inventor: Zhigang Xie , Wei Wang , Zheng Xu , Jianming Fu
- Applicant: SolarCity Corporation
- Applicant Address: US CA San Mateo
- Assignee: SolarCity Corporation
- Current Assignee: SolarCity Corporation
- Current Assignee Address: US CA San Mateo
- Main IPC: H01J37/34
- IPC: H01J37/34 ; H01L31/0216 ; H01J37/32 ; C23C14/35 ; H01L31/18
Abstract:
One embodiment of the present invention provides a sputtering system for large-scale fabrication of solar cells. The sputtering system includes a reaction chamber, a rotary target situated inside the reaction chamber which is capable of rotating about a longitudinal axis, and an RF power source coupled to at least one end of the rotary target to enable RF sputtering. The length of the rotary target is between 0.5 and 5 meters.
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