Invention Application
- Patent Title: ABERRATION-CORRECTING METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM
- Patent Title (中): 求解校正方法,使用归一化校正方法的激光加工方法,使用归一化校正方法的激光辐射方法,去除校正装置和校正校正程序
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Application No.: US15073924Application Date: 2016-03-18
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Publication No.: US20160202477A1Publication Date: 2016-07-14
- Inventor: Haruyasu ITO , Naoya MATSUMOTO , Takashi INOUE
- Applicant: HAMAMATSU PHOTONICS K.K.
- Priority: JP2008-223582 20080901; JP2009-125759 20090525
- Main IPC: G02B27/00
- IPC: G02B27/00 ; G02B5/18 ; G02B21/02 ; G02B21/00 ; G02B21/36

Abstract:
In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as Δs.
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