Invention Application
- Patent Title: METHODS AND SYSTEMS TO IMPROVE PEDESTAL TEMPERATURE CONTROL
- Patent Title (中): 改善温度控制的方法和系统
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Application No.: US14593873Application Date: 2015-01-09
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Publication No.: US20160204009A1Publication Date: 2016-07-14
- Inventor: Son Nguyen , Dmitry Lubomirsky , Chungman Kim , Kirby H. Floyd
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/67
- IPC: H01L21/67
Abstract:
A semiconductor processing system may include a substrate pedestal. The system may also include at least one fluid channel having a delivery portion configured to deliver a temperature controlled fluid to the substrate pedestal, and having a return portion configured to return the temperature controlled fluid from the substrate pedestal. The system may also include a heater coupled with the delivery portion of the at least one fluid channel. The system may also include a temperature measurement device coupled with the return portion of the at least one fluid channel, and the temperature measurement device may be communicatively coupled with the heater.
Public/Granted literature
- US11257693B2 Methods and systems to improve pedestal temperature control Public/Granted day:2022-02-22
Information query
IPC分类:
