Invention Application
US20160209746A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND
审中-公开
活性光敏或辐射敏感性树脂组合物，主动感光或辐射敏感膜，主动光敏或辐射敏感膜，图案形成方法，制造电子器件的方法，电子器件和新化合物的掩蔽层
- Patent Title: ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND
- Patent Title (中): 活性光敏或辐射敏感性树脂组合物，主动感光或辐射敏感膜，主动光敏或辐射敏感膜，图案形成方法，制造电子器件的方法，电子器件和新化合物的掩蔽层
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Application No.: US15080714Application Date: 2016-03-25
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Publication No.: US20160209746A1Publication Date: 2016-07-21
- Inventor: Shuhei YAMAGUCHI , Tomotaka TSUCHIMURA , Natsumi YOKOKAWA , Koutarou TAKAHASHI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-205970 20130930
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20 ; C07D487/04 ; C07C275/24 ; C07C233/36 ; G03F7/32 ; C07D239/10
Abstract:
There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).
Public/Granted literature
Information query
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