Invention Application
US20160209747A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION 审中-公开
活性光敏或辐射敏感组合物,耐蚀膜,图案形成方法,耐光涂布掩模,生产光电子产品的方法,光电子产品,制造电子器件的方法和电子设备,其中每个使用有效的敏感或辐射敏感性 组成

  • Patent Title: ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION
  • Patent Title (中): 活性光敏或辐射敏感组合物,耐蚀膜,图案形成方法,耐光涂布掩模,生产光电子产品的方法,光电子产品,制造电子器件的方法和电子设备,其中每个使用有效的敏感或辐射敏感性 组成
  • Application No.: US15081089
    Application Date: 2016-03-25
  • Publication No.: US20160209747A1
    Publication Date: 2016-07-21
  • Inventor: Shuhei YAMAGUCHI
  • Applicant: FUJIFILM Corporation
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP2013-200599 20130926
  • Main IPC: G03F7/039
  • IPC: G03F7/039 G03F1/78 G03F7/32 G03F1/50 G03F7/038 G03F7/20
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION
Abstract:
There is provided an active light sensitive or radiation sensitive composition which contains (A) a compound that generates an acid by irradiation with active light or radiation, (P) a compound of which the solubility in alkali developers is increased due to the action of an acid, and (N) at least one specific compound, and which can satisfy high resolving power, an excellent pattern shape, and low line width roughness (LWR) at the same time to a high level in formation of a very fine pattern (for example, a line width of 50 nm or less), and a resist film, a pattern forming method, a resist-coated mask blank, a method for producing a photomask, a photomask, a method for manufacturing an electronic device, and an electronic device, each of which uses this active light sensitive or radiation sensitive composition.
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