发明申请
- 专利标题: SYSTEMS AND METHODS FOR INTERNAL SURFACE CONDITIONING IN PLASMA PROCESSING EQUIPMENT
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申请号: US15139243申请日: 2016-04-26
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公开(公告)号: US20160240402A1公开(公告)日: 2016-08-18
- 发明人: Soonam Park , Yufei Zhu , Edwin C. Suarez , Nitin K. Ingle , Dmitry Lubomirsky , Jiayin Huang
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01J37/32 ; C23C16/455 ; C23C16/50
摘要:
A method of conditioning internal surfaces of a plasma source includes flowing first source gases into a plasma generation cavity of the plasma source that is enclosed at least in part by the internal surfaces. Upon transmitting power into the plasma generation cavity, the first source gases ignite to form a first plasma, producing first plasma products, portions of which adhere to the internal surfaces. The method further includes flowing the first plasma products out of the plasma generation cavity toward a process chamber where a workpiece is processed by the first plasma products, flowing second source gases into the plasma generation cavity. Upon transmitting power into the plasma generation cavity, the second source gases ignite to form a second plasma, producing second plasma products that at least partially remove the portions of the first plasma products from the internal surfaces.
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