公开(公告)号：US10796922B2

公开(公告)日：2020-10-06

申请号：US16665834

申请日：2019-10-28

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  H01L21/3213 ,  G01J3/02 ,  C23C16/50 ,  H01L21/311 ,  H01L21/3065 ,  H01L21/67 ,  H01L21/66 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/52 ,  G01J3/443

摘要： In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.

公开(公告)号：US09846130B2

公开(公告)日：2017-12-19

申请号：US14628733

申请日：2015-02-23

申请人： Applied Materials, Inc.

发明人： Satoru Kobayashi ,  Yufei Zhu ,  Saurabh Garg ,  Soonam Park ,  Dmitry Lubomirsky

IPC分类号： G01N22/00

CPC分类号： G01N22/00

摘要： A test device for testing an electrical property of a chamber component, such as a ceramic ring, includes an outer conductor and an inner conductor disposed within and electrically isolated from the outer conductor. The outer conductor has a base, a top, and an interior sidewall disposed between the base and the top. The inner conductor has a top portion having a first diameter and a bottom portion having a second diameter, in which the second diameter is greater than the first diameter. A sample area is defined between the base of the outer conductor and the bottom portion of the inner conductor, and is configured to receive a chamber component. The electrical property of the chamber component is measurable based on application of a signal to at least one of the outer conductor or the inner conductor.

公开(公告)号：US20160104648A1

公开(公告)日：2016-04-14

申请号：US14514213

申请日：2014-10-14

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01L21/66 ,  H01L21/67 ,  H01L21/3065

CPC分类号： H01L21/67069 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32532 ,  H01J37/3255 ,  H01J37/32972 ,  H01J2237/334 ,  H01L21/31116 ,  H01L21/32137 ,  H01L21/67253 ,  H01L22/26

摘要： A method of conditioning internal surfaces of a plasma source includes flowing first source gases into a plasma generation cavity of the plasma source that is enclosed at least in part by the internal surfaces. Upon transmitting power into the plasma generation cavity, the first source gases ignite to form a first plasma, producing first plasma products, portions of which adhere to the internal surfaces. The method further includes flowing the first plasma products out of the plasma generation cavity toward a process chamber where a workpiece is processed by the first plasma products, flowing second source gases into the plasma generation cavity. Upon transmitting power into the plasma generation cavity, the second source gases ignite to form a second plasma, producing second plasma products that at least partially remove the portions of the first plasma products from the internal surfaces.

摘要翻译： 调节等离子体源的内表面的方法包括将第一源气体流入等离子体源的等离子体产生腔中，所述等离子体源至少部分地被内表面封闭。 在将功率发射到等离子体产生腔中时，第一源气体点燃以形成第一等离子体，产生第一等离子体产物，其部分粘附到内表面。 该方法还包括使第一等离子体产物从等离子体产生腔流出到处理室，其中工件被第一等离子体产物处理，使第二源气体流入等离子体产生腔。 在将功率发射到等离子体产生腔中时，第二源气体点燃以形成第二等离子体，产生至少部分地从内表面去除第一等离子体产物的部分的第二等离子体产物。

公开(公告)号：US20160104606A1

公开(公告)日：2016-04-14

申请号：US14514222

申请日：2014-10-14

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  C23C16/50 ,  G01J3/02

CPC分类号： H01J37/32972 ,  C23C16/4405 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52 ,  G01J3/0218 ,  G01J3/443 ,  H01J37/32082 ,  H01J37/32532 ,  H01J37/3255

摘要： In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.

摘要翻译： 在一个实施例中，等离子体源包括构造成通过其中的第一穿孔传送一个或多个等离子体源气体的第一电极; 绝缘体，设置成围绕第一电极的周边与第一电极接触; 以及第二电极，设置有第二电极的周边抵靠绝缘体，使得第一和第二电极和绝缘体限定等离子体产生腔。 第二电极被配置为使等离子体产物从等离子体产生腔通过其中朝向处理室移动。 电源提供穿过第一和第二电极的电力，以使等离子体与等离子体产生腔中的一个或多个等离子体源气体点燃以产生等离子体产物。 第一电极，第二电极和绝缘体之一包括提供来自等离子体的光信号的端口。

公开(公告)号：US20180240654A1

公开(公告)日：2018-08-23

申请号：US15957827

申请日：2018-04-19

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  C23C16/44 ,  G01J3/02 ,  C23C16/50 ,  C23C16/52 ,  C23C16/455 ,  C23C16/452

CPC分类号： H01L21/32136 ,  C23C16/4405 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52 ,  G01J3/0218 ,  G01J3/443 ,  H01J37/32082 ,  H01J37/32532 ,  H01J37/3255 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J37/3299 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/67069 ,  H01L22/26

摘要： In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.

公开(公告)号：US20170229293A1

公开(公告)日：2017-08-10

申请号：US15581425

申请日：2017-04-28

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  H01L21/3213 ,  C23C16/455 ,  H01L21/66 ,  C23C16/505 ,  C23C16/52 ,  H01L21/311 ,  H01L21/67

摘要： A method of conditioning internal surfaces of a plasma source includes flowing first source gases into a plasma generation cavity of the plasma source that is enclosed at least in part by the internal surfaces. Upon transmitting power into the plasma generation cavity, the first source gases ignite to form a first plasma, producing first plasma products, portions of which adhere to the internal surfaces. The method further includes flowing the first plasma products out of the plasma generation cavity toward a process chamber where a workpiece is processed by the first plasma products, flowing second source gases into the plasma generation cavity. Upon transmitting power into the plasma generation cavity, the second source gases ignite to form a second plasma, producing second plasma products that at least partially remove the portions of the first plasma products from the internal surfaces.

公开(公告)号：US10593523B2

公开(公告)日：2020-03-17

申请号：US15139243

申请日：2016-04-26

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  H01L21/66 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/67 ,  C23C16/455 ,  C23C16/50 ,  C23C16/505 ,  C23C16/52

摘要： A method of conditioning internal surfaces of a plasma source includes flowing first source gases into a plasma generation cavity of the plasma source that is enclosed at least in part by the internal surfaces. Upon transmitting power into the plasma generation cavity, the first source gases ignite to form a first plasma, producing first plasma products, portions of which adhere to the internal surfaces. The method further includes flowing the first plasma products out of the plasma generation cavity toward a process chamber where a workpiece is processed by the first plasma products, flowing second source gases into the plasma generation cavity. Upon transmitting power into the plasma generation cavity, the second source gases ignite to form a second plasma, producing second plasma products that at least partially remove the portions of the first plasma products from the internal surfaces.

公开(公告)号：US20180073994A1

公开(公告)日：2018-03-15

申请号：US15817599

申请日：2017-11-20

申请人： Applied Materials, Inc.

发明人： Satoru Kobayashi ,  Yufei Zhu ,  Saurabh Garg ,  Soonam Park ,  Dmitry Lubomirsky

IPC分类号： G01N22/00

CPC分类号： G01N22/00

摘要： A test fixture includes an outer conductor and an inner conductor disposed within and electrically isolated from the outer conductor. The inner conductor includes a top portion having a first diameter, a bottom portion having a second diameter, and a third portion proximate the bottom portion that has a third diameter that is less than the second diameter and is greater than the first diameter. An electrical property of a chamber component disposed within the outer conductor is measurable based on application of a signal to at least one of the outer conductor or the inner conductor.

公开(公告)号：US09355922B2

公开(公告)日：2016-05-31

申请号：US14514213

申请日：2014-10-14

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01L21/3065 ,  H01L21/66 ,  H01L21/67

CPC分类号： H01L21/67069 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32532 ,  H01J37/3255 ,  H01J37/32972 ,  H01J2237/334 ,  H01L21/31116 ,  H01L21/32137 ,  H01L21/67253 ,  H01L22/26

摘要： A method of conditioning internal surfaces of a plasma source includes flowing first source gases into a plasma generation cavity of the plasma source that is enclosed at least in part by the internal surfaces. Upon transmitting power into the plasma generation cavity, the first source gases ignite to form a first plasma, producing first plasma products, portions of which adhere to the internal surfaces. The method further includes flowing the first plasma products out of the plasma generation cavity toward a process chamber where a workpiece is processed by the first plasma products, flowing second source gases into the plasma generation cavity. Upon transmitting power into the plasma generation cavity, the second source gases ignite to form a second plasma, producing second plasma products that at least partially remove the portions of the first plasma products from the internal surfaces.

摘要翻译： 调节等离子体源的内表面的方法包括将第一源气体流入等离子体源的等离子体产生腔中，所述等离子体源至少部分地被内表面封闭。 在将功率发射到等离子体产生腔中时，第一源气体点燃以形成第一等离子体，产生第一等离子体产物，其部分粘附到内表面。 该方法还包括使第一等离子体产物从等离子体产生腔流出到处理室，其中工件被第一等离子体产物处理，使第二源气体流入等离子体产生腔。 在将功率发射到等离子体产生腔中时，第二源气体点燃以形成第二等离子体，产生至少部分地从内表面去除第一等离子体产物的部分的第二等离子体产物。

公开(公告)号：US09966240B2

公开(公告)日：2018-05-08

申请号：US14514222

申请日：2014-10-14

申请人： Applied Materials, Inc.

发明人： Soonam Park ,  Yufei Zhu ,  Edwin C. Suarez ,  Nitin K. Ingle ,  Dmitry Lubomirsky ,  Jiayin Huang

IPC分类号： H01J37/32 ,  G01J3/02 ,  C23C16/50 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/52

CPC分类号： H01J37/32972 ,  C23C16/4405 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52 ,  G01J3/0218 ,  G01J3/443 ,  H01J37/32082 ,  H01J37/32532 ,  H01J37/3255

摘要： In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.