发明申请
US20160280724A1 N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM
审中-公开
N-烷基取代的环状和低级PERHYDRIDOSILAZANES，其制备方法和形成的氮化硅膜
- 专利标题： N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM
- 专利标题（中）： N-烷基取代的环状和低级PERHYDRIDOSILAZANES，其制备方法和形成的氮化硅膜
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申请号： US15070693申请日： 2016-03-15
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公开(公告)号： US20160280724A1公开(公告)日： 2016-09-29
- 发明人: Barry C. ARKLES , Youlin PAN , Fernando JOVE
- 申请人： Gelest Technologies, Inc.
- 主分类号： C07F7/21
- IPC分类号： C07F7/21 ; C08G77/62 ; C01B21/068 ; C07F7/02
摘要：
Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
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