公开(公告)号：US20180030072A1

公开(公告)日：2018-02-01

申请号：US15728634

申请日：2017-10-10

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/10 ,  C07F7/08 ,  C01B21/082 ,  H01L21/02 ,  C01B21/068

CPC分类号： C07F7/10 ,  C01B21/068 ,  C01B21/0828 ,  C07F7/0898 ,  H01L21/02167 ,  H01L21/0217 ,  H01L21/02219

摘要： Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R′ is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

公开(公告)号：US20200010488A1

公开(公告)日：2020-01-09

申请号：US16572451

申请日：2019-09-16

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/10 ,  C07F7/08 ,  H01L21/02 ,  C01B21/068 ,  C01B21/082

摘要： Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R′ is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

公开(公告)号：US20180030071A1

公开(公告)日：2018-02-01

申请号：US15728606

申请日：2017-10-10

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/10 ,  C07F7/08 ,  C01B21/082 ,  H01L21/02 ,  C01B21/068

摘要： Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R′ is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

公开(公告)号：US20210206786A1

公开(公告)日：2021-07-08

申请号：US17210652

申请日：2021-03-24

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/21 ,  H01L21/02 ,  C01B21/068 ,  C07F7/02 ,  C08G77/62

摘要： Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.

公开(公告)号：US20160368934A1

公开(公告)日：2016-12-22

申请号：US15176703

申请日：2016-06-08

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/10 ,  C01B21/068 ,  C01B21/082 ,  C07F7/08

CPC分类号： C07F7/10 ,  C01B21/068 ,  C01B21/0828 ,  C07F7/0898 ,  H01L21/02167 ,  H01L21/0217 ,  H01L21/02219

摘要： Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R′ is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

摘要翻译： 其中R是取代或未取代的有机基团，R'是烷基。 这些化合物通过开环反应与各种有机和无机羟基反应，并可用于制备氮化硅或碳氮化硅膜。

公开(公告)号：US20160280724A1

公开(公告)日：2016-09-29

申请号：US15070693

申请日：2016-03-15

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/21 ,  C08G77/62 ,  C01B21/068 ,  C07F7/02

CPC分类号： C07F7/21 ,  C01B21/068 ,  C07F7/025 ,  C08G77/62 ,  H01L21/0217 ,  H01L21/02219 ,  H01L21/02222 ,  H01L21/02271 ,  H01L21/02274

摘要： Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.

摘要翻译： 提供新的N-烷基取代的全氢化环硅氮烷，低聚N-烷基过氢化硅氮烷化合物和N-烷基氨基二氢卤代硅烷，以及它们的合成方法。 新型化合物可用于通过热或等离子体诱导的分解形成高氮化硅含量的膜。