Invention Application
US20160291472A1 HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION
审中-公开
HARDMASK组合物和使用HARDMASK组合物形成图案的方法
- Patent Title: HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN USING THE HARDMASK COMPOSITION
- Patent Title (中): HARDMASK组合物和使用HARDMASK组合物形成图案的方法
-
Application No.: US14843003Application Date: 2015-09-02
-
Publication No.: US20160291472A1Publication Date: 2016-10-06
- Inventor: Hyeonjin SHIN , Sangwon KIM , Minsu SEOL , Seongjun PARK , Yeonchoo CHO
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2015-0047492 20150403
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/36 ; G03F7/16
Abstract:
A hardmask composition may include graphene nanoparticles having a size in a range of about 5 nm to about 100 nm and a solvent.
Information query
IPC分类:
