Invention Application
US20160307950A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF 审中-公开
半导体结构及其制造方法

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
Abstract:
A semiconductor structure includes a substrate including a first side and a second side disposed opposite to the first side and configured to receive an electromagnetic radiation, a barrier layer disposed over the second side of the substrate, a color filter disposed over the barrier layer, and a grid surrounding the color filter and disposed over the barrier layer, wherein the barrier layer is configured to absorb or reflect non-visible light in the electromagnetic radiation, and the barrier layer is disposed between the grid and the substrate.
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