发明申请
US20160315193A1 SEMICONDUCTOR DEVICES INCLUDING FIN BODIES WITH VARIED EPITAXIAL LAYERS
有权
半导体器件,包括具有不同外延层的晶体管
- 专利标题: SEMICONDUCTOR DEVICES INCLUDING FIN BODIES WITH VARIED EPITAXIAL LAYERS
- 专利标题(中): 半导体器件,包括具有不同外延层的晶体管
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申请号: US15138914申请日: 2016-04-26
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公开(公告)号: US20160315193A1公开(公告)日: 2016-10-27
- 发明人: DONGWOO KIM , SEUNGHUN LEE , SUNJUNG KIM , HYUNJUNG LEE , BONYOUNG KOO
- 申请人: Samsung Electronics Co., Ltd.
- 优先权: KR10-2015-0059166 20150427
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H01L29/06 ; H01L29/165 ; H01L29/08 ; H01L29/161
摘要:
A semiconductor device can include a substrate and a fin body that protrudes from a surface of the substrate. The fin body can include a lower portion having a first lattice structure and an upper portion, separated from the lower portion by a boundary, the upper portion having a second lattice structure that is different than the first lattice structure. An epitaxially grown epitxial layer can be on the lower and upper portions.
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