Invention Application
- Patent Title: VAPOR DEPOSITION APPARATUS
- Patent Title (中): 蒸气沉积装置
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Application No.: US15205815Application Date: 2016-07-08
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Publication No.: US20160322574A1Publication Date: 2016-11-03
- Inventor: Jin-Kwang KIM , Seung-Yong SONG , Myung-Soo HUH , Suk-Won JUNG , Choel-Min JANG , Jae-Hyun KIM , Sung-Chul KIM
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2012-0131114 20121119
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C16/50 ; C23C16/455 ; C23C16/44 ; H01L51/56 ; H01L51/52

Abstract:
A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
Public/Granted literature
- US10446753B2 Vapor deposition apparatus including a blocking gas flow generation unit Public/Granted day:2019-10-15
Information query
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