Invention Application
US20160322574A1 VAPOR DEPOSITION APPARATUS 审中-公开
蒸气沉积装置

VAPOR DEPOSITION APPARATUS
Abstract:
A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
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