公开(公告)号：US20170200778A1

公开(公告)日：2017-07-13

申请号：US15370495

申请日：2016-12-06

申请人： Samsung Display Co., Ltd.

发明人： Woo-Sik JEON ,  Dong-Gyu KIM ,  Sung-Chul KIM ,  Ok-Keun SONG ,  Sung-Soo LEE

IPC分类号： H01L27/32 ,  H01L51/50 ,  H01L51/52

CPC分类号： H01L27/3262 ,  H01L27/3213 ,  H01L27/3246 ,  H01L27/326 ,  H01L51/5012 ,  H01L51/5203 ,  H01L51/5237 ,  H01L2251/5323

摘要： An organic light emitting display device includes a substrate including a sub-pixel region and a transparent region, a first semiconductor element in the sub-pixel region on the substrate, a second semiconductor element overlapping at least a portion of the sub-pixel region on the substrate, and is spaced apart from the first semiconductor element, a first lower electrode disposed in the sub-pixel region on the first semiconductor element and electrically connected to the first semiconductor element, a second lower electrode disposed in the transparent region on the substrate and electrically connected to the second semiconductor element, a first light emitting layer on the first lower electrode, a second light emitting layer on the second lower electrode, and an upper electrode on the first and second light emitting layers where second lower electrode has a thickness that is less than a thickness of the first lower electrode, and transmits a light.

公开(公告)号：US20150031167A1

公开(公告)日：2015-01-29

申请号：US14269175

申请日：2014-05-04

申请人： Samsung Display Co., Ltd.

发明人： Myung-Soo HUH ,  Suk-Won JUNG ,  Sung-Chul KIM ,  Sang-Hyuk HONG ,  Choel-Min JANG

IPC分类号： H01L51/52 ,  H01L21/02 ,  H01L21/285 ,  H01L51/56

CPC分类号： H01L21/28506 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/45578 ,  C23C16/458 ,  C23C16/509 ,  H01J37/32357 ,  H01J37/3244 ,  H01L21/02274 ,  H01L51/001 ,  H01L51/56

摘要： A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.

摘要翻译： 用于在基板上进行沉积处理的沉积装置包括：注入单元，其包括等离子体产生元件，该等离子体产生元件接纳原料气体，并将原料气体以基本形式转化为沉积源材料; 以及等离子体处理器，其与所述注入单元相邻并且面向所述注入单元的一侧，其中所述等离子体处理器在面向所述基板的方向上执行等离子体处理。

公开(公告)号：US20210399075A1

公开(公告)日：2021-12-23

申请号：US17465042

申请日：2021-09-02

申请人： Samsung Display Co., Ltd.

发明人： Woo-Sik JEON ,  Dong-Gyu KIM ,  Sung-Chul KIM ,  Ok-Keun SONG ,  Sung-Soo LEE

IPC分类号： H01L27/32 ,  H01L51/50 ,  H01L51/52

摘要： An organic light emitting display device includes a substrate including a sub-pixel region and a transparent region, a first semiconductor element in the sub-pixel region on the substrate, a second semiconductor element overlapping at least a portion of the sub-pixel region on the substrate, and is spaced apart from the first semiconductor element, a first lower electrode disposed in the sub-pixel region on the first semiconductor element and electrically connected to the first semiconductor element, a second lower electrode disposed in the transparent region on the substrate and electrically connected to the second semiconductor element, a first light emitting layer on the first lower electrode, a second light emitting layer on the second lower electrode, and an upper electrode on the first and second light emitting layers where second lower electrode has a thickness that is less than a thickness of the first lower electrode, and transmits a light.

公开(公告)号：US20160322574A1

公开(公告)日：2016-11-03

申请号：US15205815

申请日：2016-07-08

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jin-Kwang KIM ,  Seung-Yong SONG ,  Myung-Soo HUH ,  Suk-Won JUNG ,  Choel-Min JANG ,  Jae-Hyun KIM ,  Sung-Chul KIM

IPC分类号： H01L51/00 ,  C23C16/50 ,  C23C16/455 ,  C23C16/44 ,  H01L51/56 ,  H01L51/52

CPC分类号： H01L51/0021 ,  C23C14/24 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/50 ,  H01B13/30 ,  H01L27/3244 ,  H01L51/5206 ,  H01L51/5221 ,  H01L51/5253 ,  H01L51/56 ,  H01L2227/323

摘要： A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.

摘要翻译： 一种气相沉积装置，其中通过移动基板进行沉积工艺，所述气相沉积设备包括向基板注入至少一种原料气体的供应单元和对应于供应设置的阻塞气体流产生单元 并且产生阻挡原料气体流动的气流。