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公开(公告)号：US20160376698A1
公开(公告)日：2016-12-29
申请号：US15261629
申请日：2016-09-09
发明人： Yong-Suk LEE , Myung-Soo HUH , Suk-Won JUNG , Jeong-Ho YI , Mi-Ra AN
IPC分类号： C23C14/54
CPC分类号： C23C14/543 , B05D1/60 , C23C14/12 , C23C14/246 , C23C14/544 , C23C16/4481
摘要： A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.
摘要翻译： 公开了一种单体蒸发装置及其控制方法。 单体蒸发装置包括：第一蒸发器和第二蒸发器，其分别接收吹扫气体并蒸发第一单体和第二单体; 第一流管和第二流管，其连接到相应的蒸发器并允许由各蒸发器蒸发的第一单体和第二单体流过其中; 过渡管，其连接到所述第一流管和所述第二流管，并且将至少一个所述第一单体和所述第二单体供应到沉积室; 以及调节单体流入沉积室的控制阀装置。 该装置有助于将单体平滑且不间断地应用于沉积室的内部。
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2.发明申请VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 审中-公开蒸气沉积装置及制造有机发光显示装置的方法公开(公告)号：US20140174360A1
公开(公告)日：2014-06-26
申请号：US14020848
申请日：2013-09-08
发明人： Myung-Soo HUH , Suk-Won JUNG , Jin-Kwang KIM , In-Kyo KIM , Choel-Min JANG
IPC分类号： H01L51/56
CPC分类号： H01L51/56 , C23C16/452 , H01J37/32357
摘要： A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.
摘要翻译： 一种用于在基板上形成沉积层的气相沉积装置，所述气相沉积装置包括：供给单元，被配置为接收第一源气体，与供给单元连接的反应空间，反应空间中的等离子体发生器，第一注入单元 被配置为将沉积源材料注入到所述基板，所述沉积源材料包括所述第一源气体和所述反应空间中的细丝单元，所述灯丝单元连接到电源。
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公开(公告)号：US20190256978A1
公开(公告)日：2019-08-22
申请号：US16404223
申请日：2019-05-06
发明人： Yong-Suk LEE , Suk-Won JUNG , Myung-Soo HUH , Mi-Ra AN
IPC分类号： C23C16/46 , H01J37/32 , C23C16/458 , C23C16/34 , C23C16/40 , C23C16/52 , C23C16/509
摘要： A plasma processing apparatus including: a chamber configured to provide a space for processing a substrate; a substrate stage configured to support the substrate within the chamber and including a first electrode, the first electrode configured to receive a first radio frequency signal; a second electrode disposed on an upper portion of the chamber to face the first electrode, the second electrode configured to receive a second radio frequency signal; a gas supply unit configured to supply a process gas onto the substrate within the chamber; and a thermal control unit configured to circulate a heat transfer medium through a first fluid passage provided in the first electrode and a second fluid passage provided in the second electrode to maintain the first and second electrodes at the same temperature.
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公开(公告)号：US20170218508A1
公开(公告)日：2017-08-03
申请号：US15492941
申请日：2017-04-20
发明人： Myung-Soo HUH , Suk-Won JUNG , Jeong-Ho YI , Sang-Hyuk HONG , Yong-Suk LEE
CPC分类号： C23C16/042 , C23C16/4405 , C23C16/4585 , C23C16/50 , C23C16/52 , H01L21/681 , H01L21/682 , H01L21/68735 , H01L21/68742 , H01L27/3244 , H01L51/0012 , H01L51/56
摘要： A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.
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公开(公告)号：US20150108442A1
公开(公告)日：2015-04-23
申请号：US14308804
申请日：2014-06-19
发明人： Jae-Hyun KIM , Myung-Soo HUH
CPC分类号： H01L51/5253 , H01L51/5256 , H01L51/5284
摘要： Provided is an organic light-emitting apparatus. The organic light-emitting apparatus includes: a substrate; an organic light-emitting device provided on the substrate and including a first electrode, a second electrode, and an intermediate layer provided between the first electrode and the second electrode; and an encapsulation layer provided to cover the organic light-emitting device, wherein the encapsulation layer includes a first organic layer and a first inorganic layer provided on the first organic layer and including carbon, and a carbon content of the first inorganic layer gradually decreases from an interface between the first organic layer and the first inorganic layer in a direction from the first organic layer to the first inorganic layer.
摘要翻译： 提供了一种有机发光装置。 有机发光装置包括：基板; 设置在所述基板上并且包括设置在所述第一电极和所述第二电极之间的第一电极，第二电极和中间层的有机发光器件; 以及设置为覆盖有机发光器件的封装层，其中所述封装层包括第一有机层和设置在所述第一有机层上并包含碳的第一无机层，并且所述第一无机层的碳含量从 在从第一有机层到第一无机层的方向上的第一有机层和第一无机层之间的界面。
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公开(公告)号：US20180342708A1
公开(公告)日：2018-11-29
申请号：US16045909
申请日：2018-07-26
发明人： Myung-Soo HUH , Suk-Won JUNG , Jin-Kwang KIM , In-Kyo KIM , Choel-Min JANG
IPC分类号： H01L51/56 , H01J37/32 , C23C16/452
摘要： A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.
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7.发明申请公开(公告)号：US20150084012A1
公开(公告)日：2015-03-26
申请号：US14291045
申请日：2014-05-30
发明人： Jin-Kwang KIM , Jae-Hyun KIM , Hang-Ki RO , Chang-Woo SHIM , Suk-Won JUNG , Sun-Taek JEONG , Myung-Soo HUH
CPC分类号： H01L51/5256
摘要： An organic light emitting display apparatus includes a substrate, a display unit on the substrate, a dispersion layer on the display unit, and a thin film encapsulation layer sealing the display unit and the dispersion layer. The dispersion layer has a diffusion coefficient in a horizontal direction that is greater than a diffusion coefficient in a vertical direction.
摘要翻译： 有机发光显示装置包括基板，基板上的显示单元，显示单元上的分散层，以及密封显示单元和分散层的薄膜封装层。 分散层在水平方向上的扩散系数大于垂直方向上的扩散系数。
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8.发明申请公开(公告)号：US20150031167A1
公开(公告)日：2015-01-29
申请号：US14269175
申请日：2014-05-04
发明人： Myung-Soo HUH , Suk-Won JUNG , Sung-Chul KIM , Sang-Hyuk HONG , Choel-Min JANG
IPC分类号： H01L51/52 , H01L21/02 , H01L21/285 , H01L51/56
CPC分类号： H01L21/28506 , C23C16/452 , C23C16/45565 , C23C16/45578 , C23C16/458 , C23C16/509 , H01J37/32357 , H01J37/3244 , H01L21/02274 , H01L51/001 , H01L51/56
摘要： A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.
摘要翻译： 用于在基板上进行沉积处理的沉积装置包括：注入单元，其包括等离子体产生元件，该等离子体产生元件接纳原料气体，并将原料气体以基本形式转化为沉积源材料; 以及等离子体处理器，其与所述注入单元相邻并且面向所述注入单元的一侧，其中所述等离子体处理器在面向所述基板的方向上执行等离子体处理。
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9.发明申请VAPOR DEPOSITION APPARATUS, DEPOSITION METHOD USING THE SAME, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 有权蒸气沉积装置，使用其的沉积方法和制造有机发光显示装置的方法公开(公告)号：US20140322849A1
公开(公告)日：2014-10-30
申请号：US14250697
申请日：2014-04-11
发明人： Jae-Hyun KIM , Myung-Soo HUH
CPC分类号： H01L51/0008 , C23C16/403 , C23C16/45542 , C23C16/45551 , C23C16/513 , H01L51/56
摘要： A vapor deposition apparatus for forming a deposition layer on a substrate includes a supply unit that is supplied with a first raw gas to form the deposition layer and an auxiliary gas, wherein the auxiliary gas does not constitute a raw material to form the deposition layer, a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas, a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form, and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate.
摘要翻译： 用于在基板上形成沉积层的气相沉积装置包括：供给单元，其供给第一原料气体以形成沉积层和辅助气体，其中辅助气体不构成用于形成沉积层的原料， 连接到供给单元以供应第一原料气体和辅助气体的反应空间，反应空间中的等离子体发生器，将第一原料气体的至少一部分转化成自由基形式，第一注入 连接到反应空间的部分，并且向基板供应至少第一原料气体的自由基材料。
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公开(公告)号：US20220375717A1
公开(公告)日：2022-11-24
申请号：US17668369
申请日：2022-02-09
发明人： Yong-Suk LEE , Suk-Won JUNG , Myung-Soo HUH , Mi-Ra AN
IPC分类号： H01J37/32 , H01L51/52 , C23C16/505
摘要： A plasma processing apparatus including: a chamber configured to provide a space for processing a substrate; a substrate stage configured to support the substrate within the chamber and including a first electrode, the first electrode configured to receive a first radio frequency signal; a second electrode disposed on an upper portion of the chamber to face the first electrode, the second electrode configured to receive a second radio frequency signal; a gas supply unit configured to supply a process gas onto the substrate within the chamber; and a thermal control unit configured to circulate a heat transfer medium through a first fluid passage provided in the first electrode and a second fluid passage provided in the second electrode to maintain the first and second electrodes at the same temperature.
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