Invention Application
- Patent Title: HEAT DISSIPATION SUBSTRATE AND METHOD FOR PRODUCING HEAT DISSIPATION SUBSTRATE
- Patent Title (中): 散热基板和制造散热基板的方法
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Application No.: US15109486Application Date: 2015-10-08
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Publication No.: US20160336253A1Publication Date: 2016-11-17
- Inventor: Akira FUKUI
- Applicant: SUPERUFO291 TEC
- Applicant Address: JP Kyoto-shi, Kyoto
- Assignee: SUPERUFO291 TEC
- Current Assignee: SUPERUFO291 TEC
- Current Assignee Address: JP Kyoto-shi, Kyoto
- Priority: JP2014-207809 20141009
- International Application: PCT/JP2015/078685 WO 20151008
- Main IPC: H01L23/373
- IPC: H01L23/373 ; C25D5/44 ; C25D5/34 ; C25D7/12 ; C23C18/32 ; B22F3/24 ; B22F7/00 ; B22F7/04 ; B23K1/00 ; H01L21/48 ; C25D3/12 ; B22F3/16

Abstract:
A heat dissipation substrate having a metallic layer with few defects on its surface is obtained by a process including the steps of: forming a metallic layer by plating on the surface of an alloy composite mainly composed of a powder of a principal metal, additional metal and diamond; and heating and pressurizing alloy composite coated with metallic layer, at a temperature equal to or lower than melting points of the metallic layer and the alloy composite. Consequently a heat dissipation substrate is obtained which has a coefficient of linear expansion of 6.5 ppm/K or higher and 15 ppm/K or lower as well as a degree of thermal conductivity of 420 W/m·K or higher, the substrate having a metallic layer with few defects in its surface layer and thereby allowing for a Ni-based plating on which the void percentage in the solder joint will be 5% or lower.
Public/Granted literature
- US10115655B2 Heat dissipation substrate and method for producing heat dissipation substrate Public/Granted day:2018-10-30
Information query
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