Invention Application
- Patent Title: METHOD OF MAKING AN EXTREME ULTRAVIOLET PELLICLE
- Patent Title (中): 制备极端超紫外线胶囊的方法
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Application No.: US15245499Application Date: 2016-08-24
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Publication No.: US20160363857A1Publication Date: 2016-12-15
- Inventor: Chih-Tsung Shih , Tien-Hsi Lee , Chia-Jen Chen , Shang-Chieh Chien , Shinn-Sheng Yu , Jeng-Horng Chen , Anthony Yen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Main IPC: G03F1/64
- IPC: G03F1/64

Abstract:
The present disclosure relates to an extreme ultraviolet (EUV) pellicle having a pellicle film connected to a pellicle frame. In some embodiments, the EUV pellicle has a substrate, and an adhesive material disposed onto the substrate. A pellicle frame is connected to the substrate by way of the adhesive material. The pellicle frame is configured to mount the substrate to an extreme ultraviolet (EUV) reticle.
Public/Granted literature
- US09664999B2 Method of making an extreme ultraviolet pellicle Public/Granted day:2017-05-30
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