Invention Application
US20170024506A1 METHOD FOR OPTIMIZING AN INTEGRATED CIRCUIT LAYOUT DESIGN 有权
优化集成电路布局设计的方法

METHOD FOR OPTIMIZING AN INTEGRATED CIRCUIT LAYOUT DESIGN
Abstract:
A method for optimizing an integrated circuit layout design includes the following steps. A first integrated circuit layout design including a metal line feature having several metal lines and a second integrated circuit layout design including a hole feature having several holes are obtained. A line-end hole feature of the hole feature is selected by piecing the metal line feature with the hole feature. The line-end hole feature is classified into a single hole feature and a redundant hole feature by spacings between the adjacent holes by a computer system.
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