Invention Application
US20170025268A1 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
审中-公开
基板液体处理装置，基板液体处理方法和存储介质
- Patent Title: SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
- Patent Title (中): 基板液体处理装置，基板液体处理方法和存储介质
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Application No.: US15209136Application Date: 2016-07-13
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Publication No.: US20170025268A1Publication Date: 2017-01-26
- Inventor: Hironobu Hyakutake , Takafumi Tsuchiya , Koichiro Kanzaki
- Applicant: Tokyo Electron Limited
- Priority: JP2015-145185 20150722
- Main IPC: H01L21/02
- IPC: H01L21/02
Abstract:
Disclosed is a substrate liquid processing apparatus including: a processing bath in which a processing liquid is stored; a chemical liquid component supply unit that supplies chemical liquid components; a concentration detecting unit that detects a concentration of the chemical liquid components; and a controller configured to perform a first control as a feedback control that replenishes the processing liquid with the chemical liquid components such that the concentration of the chemical liquid components contained in the processing liquid within the processing bath does not become less than a predetermined allowable lower limit, based on the concentration of the chemical liquid components detected by the concentration detecting unit. In addition, the controller performs a second control that replenishes the processing liquid with the chemical liquid components in a predetermined amount required to offset a reduction in concentration of the chemical liquid components caused by the introduction of the substrate.
Public/Granted literature
- US10928732B2 Substrate liquid processing apparatus, substrate liquid processing method, and storage medium Public/Granted day:2021-02-23
Information query
IPC分类:
