Invention Application
US20170032956A1 METHODS FOR THIN FILM DEPOSITION 审中-公开
薄膜沉积方法

METHODS FOR THIN FILM DEPOSITION
Abstract:
In accordance with some embodiments herein, methods for deposition of thin films are provided. In some embodiments, thin film deposition is performed in a plurality of stations, in which each station provides a different reactant or combination of reactants. The stations can be in gas isolation from each other so as to minimize or prevent undesired chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) reactions between the different reactants or combinations of reactants.
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