发明申请
US20170037167A1 POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST PATTERNING PROCESS
有权
聚合物化合物，阳离子组合物，层压板和电阻图案处理
- 专利标题： POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST PATTERNING PROCESS
- 专利标题（中）： 聚合物化合物，阳离子组合物，层压板和电阻图案处理
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申请号： US15206684申请日： 2016-07-11
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公开(公告)号： US20170037167A1公开(公告)日： 2017-02-09
- 发明人: Daisuke DOMON , Satoshi WATANABE , Keiichi MASUNAGA , Masaaki KOTAKE
- 申请人： SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2015-155422 20150805
- 主分类号： C08F216/10
- IPC分类号： C08F216/10 ; G03F1/78 ; G03F7/20 ; G03F7/32 ; G03F7/039 ; G03F7/09
摘要：
A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), wherein Mb+ represents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b), This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity.
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